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Research Laboratory Oki Electric Industry Co. Lid. | 論文
- Preparation of a-Si:H/a-Si_C_x:H Superlattices
- Influence of RF Power on Properties of a-Si_Ge_x:H Prepared by RF Glow Discharge Decomposition
- Effect of H_2 Plasma Etching during Glow-Discharge Deposition of Amorphous Carbon Films
- Two Components of Light-Induced Photoconductivity Decays in a-Si:H
- Influence of Deposition Conditions on Properties of Hydrogenated Amorphous Silicon Prepared by RF Glow Discharge
- Fabrication of a New Multilayered Amorphous Silicon Photoreceptor Drum by Glow Discharge Method
- 2.5 Gb/s 1:8 DEMUX IC Composed of 0.15μm Single-Gate CMOS (Special Issue on Ultra-High-Speed IC and LSI Technology)
- Very-Low-Temperature Preparation of Poly-Si Films by Plasma Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases
- Plasma Etching of ITO Thin Films Using a CH_4/H_2 Gas Mixture
- Phosphorus Doping Using Electron Cyclotrorn Resonance Plasma for Large-Area Polycrystalline Silicon Thin Film Transistors
- Phosphine Doping Effects in the Plasma Deposition of Polycrystalline Silicon Films
- Oxidation of Si(100) Surfaces with Bi and Ag Overlayers in Ozone Atmosphere