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Optoelectronics Joint Research Laboratory | 論文
- Single Photonic-Crystal Defect Switch for All-Optical Ultrafast Operation Using Two Photon Absorption(Ultrafast Photonics)
- Voltage-Dependence of Scanning Tunneling Microscopy on Titanium Surface in Air
- Processing and Superconducting Properties of GdBa_2Cu_3O_ Ceramics : Electrical Properties Condensed Matter
- Influence of Preparative Conditions on the Superconducting Characteristics in GdBa_2Cu_3O_ Ceramics : Electrical Properties of Condensed Matter
- Observation of GdBa_2Cu_3O_ Ceramic Microstructure : Electrical Properties of Condensed Matter
- Effect of Substrate Orientation on Photoluminescence of GaNAs
- A Model for DX Centers : Bond Reconstruction due to Local Random Donor-Host Atom Configurations in Mixed Semiconductor Alloys
- Layer-By-Layer Controlled Digital Etching by Means of an Electron-Beam-Excited Plasma System : Etching and Deposition Technology
- Layer-By-Layer Controlled Digital Etching by Means of an Electron-Beam-Excited Plasma System
- Study of Pulse Erasing on Phase-Change Erasable (PCE) Sampled Servo Disc : Media
- Study of Pulse Erasing on Phase-Change Erasable (PCE) Sampled Servo Disc
- New Disk Structure for Million Cycle Overwritable Phase Change Optical Disk
- Conformal Chermical Vapor Deposition TiN(111) Film Formation as an Underlayer of Al for Highly Reliable Interconnects
- Characterization of Direct-Contact Via Plug Formed by Using Selective Aluminum Chemical Vapor Deposition
- Improvement in Radiation Stability of SiN X-Ray Mask Membranes
- Recording and Erasing Characteristics at a Wavelength of 680 nm for a Phase-Change Disk Designed for 830 nm Wavelength
- Thin Injection-Molded Substrate for High Density Recording Phase-Change Rewritable Optical Disk
- Metalorganic Chemical Vapor Deposition of Aluminum-Copper Alloy Films
- Improvement of Gap-Filling Property of O_3-tetraethylorthosilicate (TEOS) Film by Ethanol Surface Treatment
- Optically High Transparent SiN Mask Membrane with Low Stress Deposited by Low Pressure Chemical Vapor Deposition