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Materials and Electronic Devices Laboratory, Mitsubishi Electric Corporation | 論文
- Hysteretic Josephson Junction Behavior of Ba_K_xBiO_3 Grain Boundary Junctions Using SrTiO_3 Bicrystal Substrates
- Dielectric Properties of (Ba,Sr)TiO_3 Thin Films Deposited by RF Sputtering
- In-plane Orientation and Coincidence Site Lattice Relation of Bi_2Sr_2CaCu_2O_x Thin Films Formed on Highly Mismatched (001) YAG Substrates
- 45° Grain Boundary Junctions in (001)-Oriented BiSrCaCuO Films
- (01n)-Oriented BiSrCaCuO Thin Films Formed on CeO_2 Buffer Layers
- Microscopic Study of an Artificial Grain Boundary Josephson Junction in a BiSrCaCuO Thin Film Formed on a SrTiO_3 (110) Substrate Using a MgO Buffer Layer
- Artificial Grain Boundary Junctions in BiSrCaCuO Thin Films with (11n) and (001) Orientation
- Dependence of Crystal Orientation of BiSrCaCuO Thin Films on Off-Angles of Vicinal SrTiO_3 (110) Surfaces
- Crystal Orientation of BiSrCaCuO (11n) Thin Films Determined by X-ray Asymmetric Reflection
- Microscopic Study on (11n)-Oriented BiSrCaCuO Films by Cross-Sectional Transmission Electron Microscopy
- BiSrCaCuO Thin Film Grown on SrTiO_3 Substrate with Off-Oriented (110) Surface
- Bi_2(Sr, Ca)_3Cu_2O_x and Bi_2(Sr, Ca)_4Cu_3O_x Thin Films with (11n) Orientation
- Molecular Oriented Thin Film of Biphenyl-4,4'-dithiol Fabricated by Molecular Beam Deposition Method
- (11n)-Oriented BiSrCaCuO Thin Film Formed on SrTiO_3(110) Substrate by RF Magnetron Sputtering
- Organotin-Containing Resists (TMAR) for X-Ray Lithography : Resist Material and Process
- Organotin-Containing Resists (TMAR) for X-Ray Lithography
- Effect of Growth Temperature on Superconducting Phases of As-Grown BiSrCaCuO Thin Film Formed by RF Magnetron Sputtering
- Preparation of Ca-Doped YBaCuO Thin Films Containing 248 Phase by RF Magnetron Sputtering
- Formation of As-Grown BiSrCaCuO Thin Films by Sputtering Three Targets Heavily Doped with Pb in Atmospheres of O_2 and N_2O/O_2 Mixtures
- Superconductivity of Bi System Thin Films Formed by Consecutively Sputtering Three Pb-Doped Targets of Slightly Different Compositions