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Lg Electronics Inst. Technol. Seoul Kor | 論文
- Noise Performance of Pseudomorphic AlGaAs/InGaAs/GaAs High Electron Mobility Transistors with Wide Head T-Shaped Gate Recessed by Electron Cyclotron Resonance Plasma Etching
- Extremely Low Noise 0.15μm T-Gate AlGaAs/InGaAs Pseudomorphic HEMTs
- Low Noise Characteristics of 0.2μm Al_Ga_As/In_Ga_As/GaAs Pseudomorphic HEMTs with Wide Head T-Shaped Multifinger Gate
- A Micromachined Millimeter-Wave Cavity Resonator on Silicon and Quartz Substrates : Instrumentation, Measurement, and Fabrication Technology
- A New Micromachined Bandpass Filter on a Quartz Substrate
- Comprehensive Study of Plasma Pretreatment Process for Thin Gate Oxide (< 10 nm) Fabricated by Electron Cyclotron Resonance Plasma Oxidation
- A Simple and Efficient Pretreatment Technology for Selective Tungsten Deposition in Low-Pressure Chemical Vapor Deposition Reactor
- Activity Coefficients of Electrons and Holes in Degenerate Semiconductors with Nonuniform Composition
- Biological Monitoring of Benzene in Residents Living near Petrochemical Industrial Areas in Korea
- Time-Varying Body Instability and Low-Frequency Noise Characteristics of Mini-Field-Dual-Body Silicon-on-Insulator Structure for Analog-Digital Mixed-Mode Circuits
- Anomalous Noise Degradation Caused by Device Size Effects in SOI MOSFETs
- AC Floating Body Effects and 1/f Noise Characteristics of Dual Body SOI Structure for Analog-Digital Mixed Mode Circuit
- Microwave Dielectric Properties of the (1-x)La_TiO_3-xLaAlO_3 System
- Effects of Microstructure on Optical Properties of Ge_2Sb_2Te_5 Thin Films
- Crystal Structure and Microwave Dielectric Properties of CaTiO_3-(Li_N_)TiO_3-(Ln_Nd_)TiO_3 (Ln = La, Dy) Ceramics
- Effect of Oxygen to Argon Ratio on Growth of Bi_4Ti_3O_ Thin Films on Ir and IrO_2 Prepared by Radio-Frequency Magnetron Sputtering
- Control of Intracellular Ammonium Level Using Specific Oxygen Uptake Rate for Overproduction of Citric Acid by Aspergillus niger
- Effects of Interfacial States on Electrical Properties of SrBi_2Ta_2O_9 Thin Films