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Laboratory of Advanced Science and Technology for Industry, University of Hyogo | 論文
- Mycelial Growth Requirements of Psilocybe argentipes
- Photonuclear Reaction of Iodine-129 with Laser-Compton Scattering Gamma-Rays Using Nd:YVO_4 Laser and Electron Storage Ring
- Fabrication of the 3 Dimension Resist Microstructure Using X-Ray Diffraction and Applying to LIGA Process
- Fabrication of the 3 Dimension Resist Microstructure Using X-Ray Diffraction
- Fabrication of High Aspect Ratio X-ray Grating Using X-ray Lithography
- Design and Fabrication of PTFE-Filled Waveguide Components by SR Direct Etching
- In-situ Contamination Thickness Measurement by Novel Resist Evaluation System at NewSUBARU
- Fabrication of Diffraction Grating with High Aspect Ratio Using X-ray Lithography Technique for X-ray Phase Imaging
- Transmission Grating Fabrication for Replicating Resist Patterns of 20 nm and Below
- Phase Defect Observation Using Extreme Ultraviolet Microscope
- Actinic Mask Inspection Using an EUV Microscope —Preparation of a Mirau Interferometer for Phase-Defect Detection—
- Development of Fast-Photospeed Chemically Amplified Resist in Extreme Ultraviolet Lithography
- Reducing off Hydrocarbon Contaminants for EUVL
- Resist Outgassing Characteristics in Extreme Ultraviolet Lithography
- At-Wavelength Extreme Ultraviolet Lithography Mask Observation Using a High-Magnification Objective with Three Multilayer Mirrors
- Effect of timiperone, a new antipsychotic drug, on the sleep-wakefulness cycle in cats.
- Fabrication of the X-Ray Mask using the Silicon Dry Etching
- Development of Nanometer Resolution Focus Detector in Vacuum for Extreme Ultraviolet Microscope