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Japan Fine Ceramics Center (jfcc) | 論文
- レーザフラッシュ法によるコーティングの熱拡散率測定
- 12-O-08 Oxidation Behavior of Aluminum Nitride Thin Films on Si and Superalloy Substrates
- Tersoff Potential Parameters for Simulating Cubic Boron Carbonitrides
- 高温用分離膜としての応用を思考したポリマープレカーサーからのSiBCN系セラミックスの合成(有機-無機変換プロセス)
- SOFC特性に及ぼす化学エッチングの効果
- Fabrication of Aluminum Nitride Thin Film and Its Oxidation Behavior
- Textured Bi-Sr-Ca-Cu-O Bulk Sample
- 低溶解性コバルト材料被覆によるMCFCニッケルカソ-ドの溶解度低減
- 新規な非酸化物系ゾルゲル法によるメソポーラスアモルファスSi-C-N膜の合成と評価(有機-無機変換プロセス)
- Preparation of Hybrid Ordered Inorganic-Organic Mesostructures from an Asymmetrically Bridged Organic Precursor Containing Both Silanolate and Phosphonate
- Synthesis of Mesoporous Silica Thin Film with Three-dimensional Accessible Pore Structure
- Molten KOH etching with Na2O2 additive for dislocation revelation in 4H-SiC epilayers and substrates
- Dislocation Revelation from (0001) Carbon-face of 4H-SiC by Using Vaporized KOH at High Temperature
- Microscopic Structure of Stepwise Threading Dislocation in 4H-SiC Substrate
- Dislocation Revelation from (0001) Carbon-face of 4H-SiC by Using Vaporized KOH at High Temperature