スポンサーリンク
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University, Kasuga, Fukuoka 816-8580, Japan | 論文
- Axial Profile of Balmer-Alpha Emission near a Tungsten Target in the Compact PWI Simulator APSEDAS
- Long Range Temperature Fluctuation in LHD
- Fabrication of Ge Metal--Oxide--Semiconductor Capacitors with High-Quality Interface by Ultrathin SiO2/GeO2 Bilayer Passivation and Postmetallization Annealing Effect of Al
- Lamb-Dip Laser-Induced Fluorescence Spectroscopy for Measuring Magnetic Field in a Plasma
- Probability Density Function of Density Fluctuations in Cylindrical Helicon Plasmas
- Neutral Transport Analysis of TRIAM-1M Plasma by Using Monte-Carlo Simulation
- Effect of Excitation Frequency on the Spatial Distributions of a Surface Wave Plasma
- Bi-Coherence Analysis of Fluctuations with Long Distance Correlation in Toroidal Plasmas
- Fabrication of TiN/Ge Contact with Extremely Low Electron Barrier Height
- One Dimensional Modeling of Radio Frequency Electric Field Penetration into Magnetized Plasmas
- Observation of Nonlinear Coupling between Low Frequency Coherent Modes and Background Turbulence in LMD-U
- Initial Trial of Plasma Mass Separation by Crossed Electric and Magnetic Fields
- A Laser Thomson Scattering System for Low Density Glow Discharge Plasmas
- Method for Detecting Defects in Silicon-On-Insulator Using Capacitance Transient Spectroscopy
- Investigation of a Step-Like Output Energy Decrease Observed in an ArF Excimer Laser for Microlithography
- Elucidation of Steplike Output Energy Decrease Observed in ArF Excimer Laser for Microlithography
- Interchange Turbulence and Radial Transport in Tokamak Scrape-Off Layer Dominated by Meso Scale Structure
- Self-Calibrated Measurement of Ion Flow Using a Fine Multihole Directional Langmuir Probe
- Low-Temperature Growth of Thin Silicon Nitride Film by Electron Cyclotron Resonance Plasma Irradiation
- Effect of Ion Mass and Ion Energy on Low-Temperature Deposition of Polycrystalline-Si Thin Film on SiO2 Layer by Using Sputtering-Type Electron Cyclotron Resonance Plasma