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Institute Of Materials Science And Engineering National Chiao Tung University | 論文
- Luminescent Characteristics of ZnGa_2O_4:Mn Phosphor Thin Films Grown by Radio-Frequency Magnetron Sputtering
- Fabrication and Characterization of Various Carbon-Clad Silicon Microtips with Ultra-Small Tip Radii
- Fabrication and Characterization of Diamond-Clad Silicon Field Emitter Arrays
- Characteristics of Nonalloyed Pseudomorphic High Electron Mobility Transistors Using InAs/In_xGa_As(x=1→0)/Al_yGa_(y=0→0.3)Contact Structures
- Effectively Blocking Copper Diffusion at Low-k Hydrogen Silsesquioxane/Copper Interface
- Substrate Bias Effect on Amorphous Hydrogenated Carbon Films Deposited by Filtered Cathodic Arc Deposition : Surfaces, Interfaces, and Films
- Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition
- Characterization of Diamond Films Grown on Amorphous SiO_2
- Microwave Dielectric Properties and Microstructures of (Ba_Pb_x)O・La_2O_3・4.7TiO_2 Ceramics
- Effect of Pulse Frequency on Leveling and Resistivity of Copper Coatings
- Effects of the Relationship between Resistivity and Additive Chemistries in Electrochemically Deposited Copper Films
- Effects of Ammonia Plasma Treatment on the Electrical Properties of Plasma-Enhanced Chemical Vapor Deposition Amorphous Hydrogenated Silicon Carbide Films
- Effects of Substrate Temperature and Oxygen Partial Pressure on the Properties of Sputtered Zirconium Titanate Thin Films
- Effect of Glass Addition on Microwave Properties of BaO・La_2O_3・4.7TiO_2
- Effect of Nb-addition on the thermal stability of rapidly solidified Al-Cr-Zr alloys
- Hydrogen Passivation of TFTs with Different Film Structure : TFT TECHNOLOGIES
- Electrooptic Characteristics of Amino-Get-Glass-Dispersed Liquid Crystal and Its Matrix Formation
- The Effects of Hydrogen Plasma Treatment on the Plasma-Enhanced Chemical Vapor Deposition a-SiC:H Films
- Study of the Processing Parameters for Field Emission Displays : OTHER DISPLAY