Substrate Bias Effect on Amorphous Hydrogenated Carbon Films Deposited by Filtered Cathodic Arc Deposition : Surfaces, Interfaces, and Films
スポンサーリンク
概要
- 論文の詳細を見る
- 社団法人応用物理学会の論文
- 2001-11-15
著者
-
Li Y‐w
National Chiao Tung Univ. Hsinchu Twn
-
CHEN Chia-Fu
Institute of Materials Sciences & Engineering, National Chiao Tung University
-
LI Yan-Way
Institute of Materials Science and Engineering, National Chiao Tung University
-
SHUE Yew-Bin
Institute of Materials Science and Engineering, National Chiao Tung University
-
YU Teng-Chien
Trace Storage Technology Corporation, Science-Based Industrical Park
-
CHANG Jack
Trace Storage Technology Corporation, Science-Based Industrical Park
-
Yu Teng-chien
Trace Storage Technology Corporation Science-based Industrical Park
-
Chang Jack
Trace Storage Technology Corporation Science-based Industrical Park
-
Li Yan-way
Institute Of Materials Science And Engineering National Chiao Tung University
-
Chen Chia-fu
Institute Of Materials Science And Engineering National Chiao Tung University
-
Shue Yew-bin
Institute Of Materials Science And Engineering National Chiao Tung University
-
Chen Chia-Fu
Institute of Materials and System Engineering, Mingdao University, 369 Wen-Hua Road, Peetow, Changhua 52345, Taiwan
関連論文
- Fabrication and Characterization of Various Carbon-Clad Silicon Microtips with Ultra-Small Tip Radii
- Fabrication and Characterization of Diamond-Clad Silicon Field Emitter Arrays
- Substrate Bias Effect on Amorphous Hydrogenated Carbon Films Deposited by Filtered Cathodic Arc Deposition : Surfaces, Interfaces, and Films
- Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition
- Characterization of Diamond Films Grown on Amorphous SiO_2
- Effect of Pulse Frequency on Leveling and Resistivity of Copper Coatings
- Effects of the Relationship between Resistivity and Additive Chemistries in Electrochemically Deposited Copper Films
- Effects of Ammonia Plasma Treatment on the Electrical Properties of Plasma-Enhanced Chemical Vapor Deposition Amorphous Hydrogenated Silicon Carbide Films
- The Effects of Hydrogen Plasma Treatment on the Plasma-Enhanced Chemical Vapor Deposition a-SiC:H Films
- Structural Evolution of Silicon Oxide Nanowires via Head-Growth Solid–Liquid–Solid Process
- Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition