Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition
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概要
- 論文の詳細を見る
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2003-01-15
著者
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CHEN Chia-Fu
Institute of Materials Sciences & Engineering, National Chiao Tung University
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LI Yan-Way
Institute of Materials Science and Engineering, National Chiao Tung University
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Chen C‐f
Institute Of Materials Science And Engineering National Chiao Tung University
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HUANG Hsiu-Ling
Institute of Materials Science and Engineering, National Chiao Tung University
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Huang Hsiu-ling
Institute Of Materials Science And Engineering National Chiao Tung University
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Li Yan-way
Institute Of Materials Science And Engineering National Chiao Tung University
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Chen Chia-fu
Institute Of Materials Science And Engineering National Chiao Tung University
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Chen Chia-Fu
Institute of Materials and System Engineering, Mingdao University, 369 Wen-Hua Road, Peetow, Changhua 52345, Taiwan
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- Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition
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- Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition