Structural Evolution of Silicon Oxide Nanowires via Head-Growth Solid–Liquid–Solid Process
スポンサーリンク
概要
- 論文の詳細を見る
In this paper, we propose a growth mechanism for silicon oxide nanowires (SiONWs) as a unique solid–liquid–solid process. SiONWs were synthesized in a furnace at 1000 °C and cooled at a high rate. Nickel and gold were introduced as catalysts to dissolve and precipitate the silicon oxide originally prepared by wet oxidation. The ratio of nickel to gold determined the precipitation rate and different "octopus-like" structures were formed. At a specific cooling rate, composition and amount of a catalyst, aligned silicon oxide nanowires with unattached ends were obtained.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-11-15
著者
-
Hsu Cheng-Hang
Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
-
Chen Chia-Fu
Institute of Materials and System Engineering, Mingdao University, 369 Wen-Hua Road, Peetow, Changhua 52345, Taiwan
-
Chan Shih-Yu
Department of Materials Science and Engineering, National Chiao Tung University, 1001 Ta Hsueh Road, Hsinchu 300, Taiwan
関連論文
- Fabrication and Characterization of Various Carbon-Clad Silicon Microtips with Ultra-Small Tip Radii
- Fabrication and Characterization of Diamond-Clad Silicon Field Emitter Arrays
- Substrate Bias Effect on Amorphous Hydrogenated Carbon Films Deposited by Filtered Cathodic Arc Deposition : Surfaces, Interfaces, and Films
- Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition
- Characterization of Diamond Films Grown on Amorphous SiO_2
- Effect of Pulse Frequency on Leveling and Resistivity of Copper Coatings
- Effects of the Relationship between Resistivity and Additive Chemistries in Electrochemically Deposited Copper Films
- Effects of Ammonia Plasma Treatment on the Electrical Properties of Plasma-Enhanced Chemical Vapor Deposition Amorphous Hydrogenated Silicon Carbide Films
- The Effects of Hydrogen Plasma Treatment on the Plasma-Enhanced Chemical Vapor Deposition a-SiC:H Films
- Structural Evolution of Silicon Oxide Nanowires via Head-Growth Solid–Liquid–Solid Process
- Effect of Post-treatment on Electrical Properties of Amorphous Hydrogenated Carbon Films Deposited by Gridless Ion Beam Deposition