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Fundamental and Environmental Research Laboratories, NEC Corporation | 論文
- Development of Scanning Near-Field Optical Microscope Working under Cryogenic Temperature and Strong Magnetic Field
- A Highly Efficient Optical Add-Drop Multiplexer Using Photonic Band Gap with Hexagonal Hole Lattice Photonic Crystal Slab Waveguides(Micro/Nano Photonic Devices,Microoptomechatronics)
- Low Optical Loss Connection for Photonic Crystal Slab Waveguides(Photonic Crystals and Their Device Applications)
- Optical Response of Photonic Crystals Requiring High Precision Band Calculation in the Form of k(ω) Including Evanescent Waves(Condensed Matter : Electronic Structure, Electrical, Magnetic and Optical Properties)
- Solid-Electrolyte Nanometer Switch(Novel Device Architectures and System Integration Technologies)
- Resolution of 1:1 Electron Stepper with Patterned Cold Cathode
- Aerosol Deposition on Transparent Electro-Optic Films for Optical Modulators(Micro/Nano Fabrication,Microoptomechatronics)
- Highly Enhanced Speed and Efficiency of Si Nano-Photodiode with a Surface-Plasmon Antenna
- Si Nano-Photodiode with a Surface Plasmon Antenna
- Large Optical Transmission through a Single Subwavelength Hole Associated with a Sharp-Apex Grating
- ORS-09 DESIGN AND FABRICATION OF PLASMON-ENHANCED OPTICAL HEADS
- Properties and Lithographic Capability of Sulfonium Salts with Aromatic Cyclic Ketone Group for ArF Chemically Amplified Resist
- ArF Chemically Amplffied Positive Resist Based on Alicyclic Lactone Polymer : Instrumentation, Measurement, and Fabrication Technology
- Thermally Stable Alkylsulfonium Salts for ArF Excimer Laser Resists
- Development of Transparent Alkylsulfonium Salt as a Photoacid Generator for ArF Excimer Laser Lithography(Special Issue on Organic Materials for Optics and Electronics)
- ArF Chemically Amplified Negative Resists Using Alicyclic Epoxy Polymer
- Chemically Amplified Resist Based on High Etch-Resistant Polymers for 193nm Lithography
- Design and Characterization of Alicyclic Polymers with Alkoxy-ethyl Protecting Groups for ArF Chemically Amplified Resists
- Chemically Amplified Negative Resists Based on Alicyclic Acrylate Polymers for 193-nm Lithography
- Coupled Waveguide Devices Based on Autocloned Photonic Crystals