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Faculty of Engineering, Osaka University | 論文
- Frequency Response of Semicircular Magnetic Spectroscope
- The Soft X-ray Spectroscopy of the Solid State by the Electronic Differentiating Method : Aluminium L_3
- Electronic Spectroscopy for Soft X-ray Region
- A Novel Dynamically Programmable Arithmetic Array(DPAA)Processor for Digital Signal Processing(Special Section of Selected Papers from the 13th Workshop on Circuits and Systems in Karuizawa)
- Thickness Dependence of Furnace N_2O-Oxynitridation Effects on Breakdown of Thermal Oxides
- Homoepitaxial Diamond Synthesis by DC Arc Plasma Jet Chemical Vapor Deposition
- Metallurgical Study on the HAZ Embrittlement of High Strength Steel (Report 1) : Application of the Quantitative Chemical Analysis for Precipitates to Steel and its Welds
- Contribution of Cementites to Notch Toughness in Structural Steel Welds
- Effect of Nonmetallic Inclusions on Hydrogen Assisted Cracking
- An Experimental Study of Cross Flow Fan : 1st Report, Effects of Housing Geometry on the Fan Performance
- Effects of Salts and Metal Oxides on Electrochemical and Optical Properties of Streptococcus mutans
- Raman Spectra of CuInSe_2 Thin Films Prepared by Chemical Spray Pyrolysis
- Intelligent Operating Theater Using Intraoperative Open-MRI
- Distribution of Electrode Elements near Contacts and Junction Layers in Amorphous Silicon Solar Cell : III-3: AMORPHOUS SOLAR CELLS (2) : Characterization
- Electrical Conductivity and Thermoelectric Power of Heat-Treated Poly (p-phenylene) Films
- Anomalous Ferromagnetic and Antiferromagnetic Properties of Polyaniline Derivatives Depending on Acidic Treatment
- Optical and Magnetic Properties of Polyaniline Derivatives Having Ionic Groups
- An Experimental Study of Cross Flow Fan : 2nd Report, Movements of Eccentric Vortex inside Impeller
- Blue and Green Cathodoluminescence of Synthesized Diamond Films Formed by Plasma-Assisted Chemical Vapour Deposition : Optical Properties of Condensed Matter
- Characterization of Diamond Particles and Films Formed by Plasma-Assisted Chemical Vapour Deposition Using High-Voltage Electron Microscopy