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Electron Device System Laboratory Kanazawa Institute Of Technology | 論文
- Study of Hydrogen Vacuum-Ultraviolet Light Sources for Submicron Lithography : Lithography Technology
- Study of Hydrogen Vacuum-Ultraviolet Light Sources for Submicron Lithography
- High-Luminance Green-Emitting Thin-Film Electroluminescent Devices Using ZnGa_2O_4:Mn Phosphor
- Absorption Coefficient and Sensitivity of Positive and Negative Resists in the Vacuum Ultraviolet Region
- Highly Transparent and Conductive Zinc-Stannate Thin Films Prepared by RF Magnetron Sputtering
- Transparent and Conductive ZnO Thin Films Prepared by Atmospheric-Pressure Chemical Vapor Deposition Using Zinc Acetylacetonate
- Large-Area Milky Transparent Conducting Al-Doped ZnO Films Prepared by Magnetron Sputtering
- Reactive Ion Etching Using Electron Cyclotron Resonance Hydrogen Plasma with n-Butyl Acetate Reactive Gas : Etching
- Reactive Ion Etching Using Electron Cyclotron Resonance Hydrogen Plasma with n-Butyl Acetate Reactive Gas
- Substrate Temperature Dependence of Transparent Conducting Al-Doped ZnO Thin Films Prepared by Magnetron Sputtering
- Highty Conductive and Transparent Silicon Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
- Group III Impurity Doped Zinc Oxide Thin Films Prepared by RF Magnetron Sputtering
- Properties of Hydrophone with Porous Piezoelectric Ceramics : Piezoelectrics
- Fabrication of Tungsten-Carbon Multilayers for Soft X-Ray Optics Using Excimer-Laser-Induced Chemical Vapor Deposition Technique
- Thickness Control of Multilayer Films in Laser-Induced Chemical Vapor Deposition
- Magnetron Sputter-Deposited A1_2O_3/SiO_2 Multilayer Coatings for Kilowatt Excimer Lasers with High Repetition Rates
- Laser-Beam-Scanning Chemical Vapor Deposition Technique for Controlling the Spatial Thickness Distribution of Thin Films
- Nanometer Pattern Transfer by VUV Lithography with a D_2 Lamp : Lithography Technology
- Nanometer Pattern Transfer by VUV Lithography with a D_2 Lamp
- Highly Conducting and Transparent SnO_2 Thin Films Prepared by RF Magnetron Sputtering on Low-Temperature Substrates : Surfaces, Interfaces and Films