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Dept. of Electronic Engineering, Chungnam National University | 論文
- Dual-gate ZnO thin-film transistors with SiNx as Dielectric Layer(Session 1A : Emerging Device Technology 1)
- Dual-gate ZnO thin-film transistors with SiNx as Dielectric Layer(Session 1A : Emerging Device Technology 1)
- Temperature effects on silicon-oxide-nitride-oxide-silicon transistors under channel hot electron injection operation (Electron devices: 第15回先端半導体デバイスの基礎と応用に関するアジア・太平洋ワークショップ(AWAD2007))
- Temperature effects on silicon-oxide-nitride-oxide-silicon transistors under channel hot electron injection operation (Silicon devices and materials: 第15回先端半導体デバイスの基礎と応用に関するアジア・太平洋ワークショップ(AWAD2007))
- Ramping Amplitude Multi-Frequency Charge Pumping Technique for Silicon-Oxide-Nirtride-Oxide-Silicon Flash EEPROM Cell Transistors
- Gate Engineering to Prevent NMOS Dopant Channeling for Nanoscale CMOSFET Technology
- Thermally Robust Nickel Silicide Process for Nano-Scale CMOS Technology(Si Devices and Processes, Fundamental and Application of Advanced Semiconductor Devices)
- SONOS-Type Flash Memory with HfO_2 Thinner than 4nm as Trapping Layer Using Atomic Layer Deposition
- Theoretical Investigation of Neutral Point Defects in CoSi_2
- P1-IS-67 Characteristic of Chaos and Canonical Correlation Analysis for Early Diagnosis of IUGR
- Dual-Gate ZnO Thin-Film Transistors with SiNx as Dielectric Layer