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Department of Electronic Engineering, Sogang University | 論文
- Construction of Scalable 2-D Multi-Weight Optical Orthogonal Codes for Optical CDMA Networks
- Multi-Symbol Detection for Biorthogonal Signals over Rayleigh Fading Channels
- A Concurrent Instruction Scheduling and Recoding Algorithm for Power Minimization in Embedded Systems
- Etching Characteristics and Mechanism of ZnO and Ga-Doped ZnO Thin Films in Inductively Coupled HBr/Ar/CHF3 Plasma
- Performance Analysis of Persistent Scheduling for VoIP Services in Mobile WiMAX Systems
- Quantitative Analysis of Hump Effects of Gate-All-Around Metal–Oxide–Semiconductor Field-Effect Transistors
- Capacity of Sectorized Distributed Networks Employing Adaptive Collaboration from Remote Antennas
- A Per-User QoS Enhancement Strategy via Downlink Cooperative Transmission Using Distributed Antennas
- A Study on the Relation between Film Quality and Deposition Rate for Amorphous Silicon Films Grown by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition Using H_2/SiH_4
- The Optimization of the Deposition Variables for High Photoconductivity a-Si:H Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition
- Capacitance-Voltage Characteristics of SiO_2 Films Prepared by Electron Cyclotron Resonance Plasma Chemical Vapor Deposition as a Function of O_2 Content and Microwave Power
- On Distorted Constellations of 16-Ary Modulation Schemes
- Compact three-way planar power divider using five-conductor coupled line
- Optimal Selection Criterion of the Modulation and Coding Scheme in Consideration of the Signaling Overhead of Mobile WiMAX Systems
- An Intercell Interference Cancellation Method for Eigen-Beamforming Transmission
- A 0.18μm CMOS 12Gb/s 10-PAM Serial Link Transmitter
- Optimizing downlink throughput of IEEE 802.16j wireless relay networks via parameterized modeling
- New digital predistortion technique of RF power amplifiers for wideband OFDM signals
- Etching Characteristics and Mechanisms of Pb(Zr,Ti)O3, Pt, and SiO2 in an Inductively Coupled HBr/Cl2 Plasma
- Etching Behavior and Mechanism of In- and Ga-Doped ZnO Thin Films in Inductively Coupled BCl3/Cl2/Ar Plasmas