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Department of Electrical Engineering, Nagoya University | 論文
- Generation of a Large Electron Beam for Plasma Processing
- Formation of CH Radical by Surface Bombardment in a Methane/Argon DC Discharge
- RF Plasma Production at Ultralow Pressures with Surface Magnetic Confinement
- Analytical Expression Based Design of a Low-Voltage FD-SOI CMOS Low-Noise Amplifier(Analog Circuit Techniques and Related Topics)
- Cylindrical Ion-Acoustic Solitons in Plasmas
- Propagatin of the Cylindrical Ion-Beam Modes in a Double Plasma
- Stabilization of Optical Interferometry for Steady Measurements
- Improvements of Detections of Fringe Shifts by a Ne-He Laser Interferometer
- Space- and Time-Resolved Measurements of Negative Ions in a Pulsed Inductively-Coupled Plasma in Chlorine
- A New Technology for Negative Ion Detection and the Rapid Electron Cooling in a Pulsed High-Density Etching Plasma
- Hydrogen-Reduced Carbonization by Acetylene Discharges
- On the Propagation of Backward Surface Wave along an Annular-plasma Guide
- Modulational Instability and Envelope-Solitons for Nonlinear Alfven Waves Propagating along the Magnetic Field in Plasmas
- Modified Nonlinear Schrodinger Equation for Alfven Waves Propagating along the Magnetic Field in Cold Plasmas
- Wall Heating Effect on Crystallization of Low-Temperature Deposited Silicon Films from an Inductuvely-Coupled Plasma
- Lower Temperature Deposition of Polycrystalline Silicon Films from a Modified Inductively Coupled Silane Plasma
- LOW-TEMPERATURE FORMATION OF poly-Si FILMS BY INDUCTIVELY-COUPLED SILANE PLASMA
- Observation of Line Splitting on Tonks-Dattner Resonances
- Drastic Change in CF_2 and CF_3 Kinetics Induced by Hydrogen Addition into CF_4 Etching Plasma
- Spatial Distribution and Surface Loss of CF_3 and CF_2 Radicals in a CF_4 Etching Plasma