スポンサーリンク
Department of Electoronics, Kyushu University | 論文
- Metal-Insulator Transition in the Bi_2Sr_2Ca_Y_xCu_2O_ System
- Characterization of a Non-Superconducting Cuprate, Bi_2Sr_2YCu_2O_ : Electrical Properties of Condensed Matter
- Reincrease in Electron Density in the Current-Decaying Phase of Pulsed-Discharge of Argon-Hydrogen Mixture : Nuclear Science, Plasmas and Electric Discharges
- Generation of a Large Swelling in the Spatial Magnetic Field Profile near the Coil Axis of a Theta Pinch
- On Shifting of Plowed Plasma to Back of Current Sheath in Implosion Phase of Theta-Pinch
- Generation of Magnetic Islands Caused by Periodical Nonuniformity of Axial Magnetic Field for FRC Formation Phase
- Study on Electron Density Dependence of Metastable Ar^+ Density in Pulsed-Discharge Plasma by Using LIF Method
- On Applicability of Laser-Induced Fluorescence from the Metastable State of Argon Ions to Ion Density Measurements
- Dependence of Evolution of Field Reconnection at Coil End Region on Mirror Field in FRC Formation Stage
- Influence of Gas Flow Conditions on Cluster Size Distribution in the Gas Evaporation Method
- Investigation of Particulate Growth Processes in RF Silane Plasmas Using Light Absorption and Scanning Electron Microscopic Methods ( Plasma Processing)
- Highly Stable a-Si:H Films Deposited by Using Multi-Hollow Plasma Chemical Vapor Deposition
- Cluster-Suppressed Plasma Chemical Vapor Deposition Method for High Quality Hydrogenated Amorphous Silicon Films
- Effects of Gas Temperature Gradient, Pulse Discharge Modulation, and Hydrogen Dilution on Particle Growth in Silane RF Discharges
- Filling Subquarter-Micron Trench Structure with High-Purity Copper Using Plasma Reactor with H Atom Source
- Conformal Deposition of High-Purity Copper Using Plasma Reactor with H Atom Source
- Effects of Gas Flow on Particle Growth in Silane RF Discharges
- Study on Initial Growth of Particles in Low-Pressure and Low-Power GeH_4 RF Discharges Using the High-Sensitivity Photon-Counting Laser-Light-Scattering Method
- Transition of Particle Growth Region in SiH_4 RF Discharges
- Similarities in Spatial Distributions of Absolute GeH_2 Density, Radical Production Rate and Particle Amount in GeH_4 RF Discharges