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Department of Ceramic Engineering, Hanyang University | 論文
- 水酸化物を出発原料に用いたSrAl_2O_4系蛍光セラミックスの合成
- 高温耐酸化性保護膜を有するC/Cコンポジットの作製
- Characteristics of Partially Disordered Gallium Nitride Nanodots Synthesized by Pulsed-Laser Ablation
- Quantum Confinement Effect of Amorphous GaN Quantum Dots Prepared by Pulsed-Laser Ablation
- Dependence of pH, Molecular Weight, and Concentration of Surfactant in Ceria Slurry on Saturated Nitride Removal Rate in Shallow Trench Isolation Chemical Mechanical Polishing
- Effect of Molecular Weight of Surfactant in Nano Ceria Slurry on Shallow Trench Isolation Chemical Mechanical Polishing (CMP)
- A Reverse Selectivity Ceria Slurry for the Damascene Gate Chemical Mechanical Planarization Process
- Influence of Physical Characteristics of Ceria Particles on Polishing Rate of Chemical Mechanical Planarization for Shallow Trench Isolation
- Effect of Forming Gas Anneal on the Properties of (Ba, Sr)RuO_3 and (Ba, Sr)TiO_3 : Semiconductors
- Microwave Characteristics of MgTiO_3-CaTiO_3 Dielectric Ceramics Fabricated Using Spark Plasma Sintering
- Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength
- Effect of Dispersant Addition during Ceria Abrasive Milling Process on Light Point Defect (LPD) Formation after Shallow Trench Isolation Chemical Mechanical Polishing (STI-CMP)
- The Stability of Nano Fwned Silica Particles and Its Influence on Chemical Mechanical Planarization for Interlayer Dielectrics
- Interface Formation and Phase Distribution Induced by Co/SiC Solid State Reactions
- SiC繊維/ホウケイ酸塩ガラス複合材の破壊挙動に及ぼす界面層の影響
- The Influence of Cu and Au on Field Aided Lateral Crystallization of Amorphous Silicon Films
- Cu-Field Aided Lateral Crystallization (FALC) of Amorphous Silicon Films below 450℃
- Cu-Field Aided Lateral Crystallization (FALC) of Amorphous Silicon Films below 450℃
- Evaluation of the Disadvantage of Radio Frequency Plasma Treatment on Polymer using Equivalent Circuit Model of Capacitor
- Electrical Characterization of Ferroelectric Pb(Zr, Ti)O3 Thin Films Deposited on Pt-Coated RuO2 Electrodes