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Department of Applied Physics, Hanyang University, Ansan 426-791, Korea | 論文
- Antimalarial Activity of Herbal Extracts Used in Traditional Medicine in Korea(Pharmacognosy)
- 32 nm Half Pitch Formation with High-Numerical-Aperture Single Exposure
- Patterning of 32 nm $1:1$ Line and Space by Resist Reflow Process
- A Mask Generation Approach to Double Patterning Technology with Inverse Lithography
- Optimum Biasing for 45 nm Node Chromeless and Attenuated Phase Shift Mask
- Critical Dimension Control for 32 nm Node Random Contact Hole Array Using Resist Reflow Process
- Photoresist Adhesion Effect of Resist Reflow Process
- Resist Reflow Process for 32 nm Node Arbitrary Pattern
- Optical Investigation of Deep Ultraviolet Degradation of Pellicles
- Line Edge Roughness Reduction Using Resist Reflow Process for 22 nm Node Extreme Ultraviolet Lithography
- Position Shift Analysis in Resist Reflow Process for Sub-50 nm Contact Hole
- Synergistic Effects of Glutathione and β-Mercaptoethanol Treatment During In Vitro Maturation of Porcine Oocytes on Early Embryonic Development in a Culture System Supplemented with L-cysteine
- Sensitivity of Simulation Parameter for Critical Dimension
- Haze Defects due to Pellicle Adhesive
- Sensitivity of Process Parameters on Pattern Formation of Litho--Cure--Litho--Etch Process
- Shot Noise Suppression in SiGe Resonant Interband Tunneling Diodes
- Anisotropic Resist Reflow Process Simulation for 22 nm Elongated Contact Holes
- Statistical Theory of Plasmas Turbulence
- Development of Calibration-Free Imaging Ellipsometry Using Dual-Rotation of Polarizer and Analyzer