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Department of Applied Electronics, Tokyo University of Science | 論文
- プリコーデッドOFDMの繰り返し復調方式におけるシンボル入れ替え方式の検討 (放送技術)
- プリコーデッドOFDMの繰り返し復調方式におけるシンボル入れ替え方式の検討(デジタル放送技術および一般)
- Three-dimensional Metal Nano Pattern Transfer on PET using Metal Oxide Layer
- Roles of Asp126 and Asp156 in the Enzyme Function of Sphingomyelinase from Bacillus cereus^1
- Mg^ Binding and Catalytic Function of Sphingomyelinase from Bacillus cereus
- Binding mode of Phospholipase A_2 with a New Type of Phospholipid Analog Having a Oxazolidinone Ring
- Measurement of the Density of OH Free Radicals in Magnetized Sheet Plasma Crossed with Vertical Gas Flow
- LIF法によるプラズマ中の酸素ラジカルの測定
- The localization of Epidermal Growth Factor and Epidermal Growth Factor Receptor in the malignant epithelium of the urinary bladder
- Isolation and Amino Acid Sequence of a Phospholipase A_2 Inhibitor from the Blood Plasma of the sea Krait, Laticauda semifasciata
- Disorder-Driven Quantum Phase Transition from Antiferromagnetic Metal to Insulating State in Multilayered High-T_c Cuprate (Cu, C) Ba_2Ca_4Cu_5O_y(Condensed matter: electronic structure and electrical, magnetic, and optical properties)
- -P331- THE RELATIONSHIPS BETWEEN ARTERIAL ENDOTHELIN-1 AT ANAEROBIC THRESHOLD OR AT REST AND PULMONARY HYPERTENSION IN PATIENTS WITH ASD OR MS.(PROCEEDINGS OF THE 59th ANNUAL SCIENTIFIC MEETING OF THE JAPANESE CIRCULATION SOCIETY)
- Optimization of Processing Condition for Deposition of DLC Using FIB-CVD Method(Advanced Manufacturing Technology (II))
- Direct Etching of Spin-on-Glass Films Exposed Using Synchrotron Radiation
- A31 Focused ion beam machining of silicon carbide(M4 processes and micro-manufacturing for science)
- Pattern Transfer of Sol-Gel Photocurable Polymer Using Nanoimprinting Method(M^4 processes and micro-manufacturing for science)
- A Study on Controlling Transmission Power of Carriers of OFDM Signal Combined with Data Symbol Spreading in Frequency Domain (Communication Theory and Signals)
- Three-Dimensional Nanofabrication Utilizing Selective Etching of Silicon Induced by Focused Ion Beam Irradiation
- Deep Structure Fabrication of Silicon Utilizing High-Energy Ion Irradiation Followed by Wet Chemical Etching(M^4 processes and micro-manufacturing for science)
- Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method