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Department Of Materiais Science And Engineering Inha University | 論文
- Influence of the aluminum and indium concentrations on the electrical resistivity and transmittance properties of InAlZnO thin films
- Influence of the anodization process conditions and the microstructure on the photothermal effect of porous silicon used as a therapeutic agent in cancer thermotherapy
- Physical Properties of Highly Conformal TiN Thin films Grown by Atomic Layer Deposition
- Influence of the annealing atmosphere on the photoluminescence of ZnSe-core/In2O3-shell nanowires
- Effects of Rapid Thermal Annealing after Plasma H_2 Pretreatment of the Copper Seed Layer Surface on Copper Electroplating : Semiconductors
- Effects of Post-Deposition Annealing on the Copper Films Electrodeposited on the ECR Plasma Cleaned Copper Seed Layer
- The Removal of Intentionally Contaminated Cu Impurities on Si Substrate Using Remote H-plasma Treatments
- Chemical Vapor Deposition of TiN Films from Tetrakis(ethylmethylamido)titanium and Ammonia
- Enhancement of Ru Nucleation in Ru-Metal Organic Chemical Vapor Deposition by Electron Cyclotron Resonance Plasma Pretreatment
- Suppression by Fucoidan of Liver Fibrogenesis via the TGF-β/Smad Pathway in Protecting against Oxidative Stress
- Effects of Process Parameters on the Deposition Rate, Hardness, and Corrosion Resistance of Tungsten Carbide Coatings Deposited by Reactive Sputtering
- Thermal Stability Enhancement of Cu Interconnects by Employing a Self-aligned MgO Layer Obtained From a Cu(Mg) Alloy Film
- Physical Properties of Highly Conformal TiN Thin films Grown by Atomic Layer Deposition