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Department Of Electrical Engineering Tsing-hua University | 論文
- The Mechanism Responsible for a Low Electrostatic Discharge Failure Threshold of an Output Buffer Circuit with Low Current Drive Capability
- The Method to Optimize Gate Oxide Integrity, Hot Carrier Effect and Electro-Static Discharge without Sacrificing the Performance in Sub-Quarter Micron Dual Gate Oxide Process
- Analytical Model of Human Body Model Electrostatic Discharge Current Distribution and Novel Electrostatic Discharge Protection Structure
- A Novel Thin Gate-Oxide-Thickness Measurement Method by LDD (Lightly-Doped-Drain)-NMOS (N-Channel Metal-Oxide-Semiconductor) Transistors
- Very Low Temperature Deposition of Polycrystalline Si Films Fabricated by Hydrogen Dilution with Electron Cyclotron Resonance Chemical Vapor Deposition
- Thin Film Transistors Made from Hydrogenated Microcrystalline Silicon
- An Anatomical Study of the Mid-Lateral Pars Relative to the Pedicle Footprint in the Lower Lumbar Spine
- Negative Differential Resistance in Ferroelectric Lead Zirconate Titanate Thin Films : Influence of Interband Tunneling on Leakage Current
- Thickness Dependence of the Time Dependent Dielectric Breakdown Characteristics of Pb(Zr, Ti)O_3 Thin Film Capacitors for Memory Device Applications
- Characterization of Ultrathin Dielectrics Grown by Microwave Afterglow Oxygen and N_2O Plasma