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Department Of Electrical Engineering Osaka Prefectural Technical College | 論文
- Increased Electron Concentration in InAs/AlGaSb Heterostructures Using a Si Planar Doped Ultrathin InAs Quantum Well
- Oxide-Voltage and Its Polarity Dependence of Interface-State-Generation Efficiency in (100) n-Si Metal/Oxide/Semiconductor Capacitors
- Capture Cross Section of Electric-Stress-Induced Interface States in (100) Si Metal/Oxide/Semiconductor Capacitors
- Surface Structure of Zr-O/W(100) System at 1700 K
- Anomaly in Sputtering on Titanium Nitride Film Growth by Post-Irradiation Processing
- Evaluation of Acid Diffusibility in a Chemical Amplification Resist Using Acidic Water-Soluble Film
- Work Function Change Measured by Electron Beam Chopping Technique as Applied to Oxygen-Adsorbed W(100) at High Temperature
- Ion-Assisted Crystal Growth by Post Irradiation as Applied to Nitride Formatiorn
- Characterization of Ion Implantation Dose by Raman Scattering and Photothermal Wave Techniques
- Secondary Defects of As^+ Implanted Silicon Measured by Thermal Wave Technique
- Evaluation of Device Charging in Ion Implantation : Ion Beam Process
- Evaluation of Device Charging in Ion Implantation
- A Study on the Potential Structure of the Barrier in Ba_K_xBiO_3/Natural-Barrier/Au Structures
- Superconducting Properties of Y-Ba-Cu-O Thin Films Prepared by RF Magnetron Sputtering with a Grid Electrode
- Detection and Printability of Shifter Defects in Phase-Shifting Masks II. : Defocus Characteristics
- Detection and Printability of Shifter Defects in Phase-Shifting Masks : Photolithography
- Pattern Transfer Characteristics of Transparent Phase Shifting Mask : Photolithography
- Detection and Printability of Shifter Defects in Phase-Shifting Masks
- Pattern Transfer Characteristics of Transparent Phase Shifting Mask
- Charge Buildup in Magnetized Process Plasma