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Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology | 論文
- Low-Temperature CVD of SiO_2 by Alkoxy-Silane-Iso-Cyanate
- Radial Profile of Toroidal Current Driven by m=1 Compressional Alfven Wave
- Effect of Axial Magnetic Fields on Electrical Characteristics of Low-Pressure Wire Discharge ( Plasma Processing)
- DC Plasma Current Drive by Means of a Rotating Magnetic Field : Nuclear Science, Plasmas and Electric Discharges
- Toroidal Current Generation by Helical Rotating Magnetic Field
- Association of IgG Fc receptor II with tyrosine kinases in the human basophilic leukemia cell line KU812F
- Low-dose exogenous interleukin (IL)-12 enhances antigen-induced interferon-γ production without affecting IL-10 production in asthmatics
- Sulfidopeptide leukotrienes, but not thromboxane B_2 or histamine, are elevated in sputum during exacerbation of asthma
- Chemical Vapor Deposition of Amorphous Silicon Using Tetrasilane
- Characterization of Chemical-Vapor-Deposited Amorphous-Silicon Films
- Low-Temperature Chemical Vapor Deposition of Silicon Nitride Using A New Source Gas : Hydrogen Azide
- Hot-Wall Chemical-Vapor-Deposition of Amorphous-Silicon and Its Application to Thin-Film Transistors
- The Effects of Hot Ion-Implantation on the Electrical Properties of Amorphous-Silicon Films Produced by Chemical-Vapor-Deposition Method
- Chemical Vapour Deposition of Amorphous Silicon with Silanes for Thin Film Transistors : The Influence of the Amorphous Silicon Deposition Temperature
- Top-Gate Amorphous-Silicon Thin-Film Transistors Produced by CVD Method
- Optimization of Chemical Vapor Deposition Conditions of Amorphous-Silicon Films for Thin-Film Transistor Application
- Amorphous-Silicon Thin-Film Transistors Using Chemical Vapor Deposition of Disilane
- Amorphous-Silicon Thin-Film Transistors with Silicon Dioxide Gate Grown in Nitric-Acid Gas
- Normal-Pressure and Low-Temperature Thermal Oxidation of Silicon
- Fabrication of Nanomanipulator with SiO_2/DLC Heterostructure by Focused-Ion-Beam Chemical Vapor Deposition