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Department Of Electrical And Electronic Engineering Tokyo Institute Of Technology | 論文
- Prospects of Thickness Reduction of the CdTe Layer in Highly Efficient CdTe Solar Cells Towards 1 μm
- Characterizaiton of ZnIn_xSe_y Thin Films as a Buffer Layer for High Efficiency Cu(InGa)Se_2 Thin-Film Solar Cells
- Emission Energy Shift in GaInAs/GaInAsP Strained Quantum-Box Structures Due to 0-Dimensional Quantum-Box Effect
- Broadband Design and Fabrication of Partially-Corporate Feed Double-Layer Waveguide Slot Antennas with Magnetic Wall Terminations due to Symmetrical Waveguide Connections
- Reparixin, an Inhibitor of CXCR1 and CXCR2 Receptor Activation, Attenuates Blood Pressure and Hypertension-Related Mediators Expression in Spontaneously Hypertensive Rats
- Risedronate Therapy for the Prevention of Steroid-induced Osteoporosis in Patients with Minimal-change Nephrotic Syndrome
- Development of Lithium-Drifted Silicon Detectors Using an Automatic Lithium-Ion Drift Apparatus
- Effects of Weight Loss on Bone Mineral Density in Rats
- Numerical Analysis to Improve the Stabilized-Efficiency of Amorphous Silicon Solar Cells with New Device Structure
- A Coaxial Line to Post-Wall Waveguide Transition for a Cost-Effective Transformer between a RF-Device and a Planar Slot-Array Antenna in 60-GHz Band(Antennas and Propagation)
- ZnGa_2O_4:Mn Phosphor Particles with Spherical Shape and Clean Surface
- Two-Dimensionally Position-Controlled Excimer-Laser-Crystallization of Silicon Thin Films on Glassy Substrate
- A Proposed Organic-Silica Film for Inter-Metal-Dielectric Application
- Preparation of Position-Controlled Crystal-Silicon Island Arrays by Means of Excimer-Laser Annealing
- A Novel Phase-Modulated Excimer-Laser Crystallization Method of Silicon Thin Films
- Preparation of Organic Silica Films with Low Dielectric Constant from the Liquid Phase
- Excimer-Laser-Induced Lateral-Growth of Silicon Thin-Films
- Excimer-Laser-Produced Single-Crystal Silicon Thin-Film Transistors
- Step-Covertage Characteristics of Silicon-Dioxide Films Formed by a New Low-Temperature Chemical-Vapor-Deposition Method
- Chemical Vapor Deposition of Hydrogen-Free Silicon-Dioxide Films