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Department Of Chemistry And School Of Molecular Science (bk21) Korea Advanced Institute Of Science A | 論文
- Synthesis and Electroluminescent Properties of New Amorphous Cyclohexyl- and Hexyl-substituted Ter(9,9-dialkylfluorene)s
- Cyclopropyl-containing Photoacid Generators for Chemically Amplified Resists
- High Performance Molecular Resists Based on β-Cyclodextrin
- Silicon-containing Bilayer Resist Based on a Single Component Nonchemically Amplified Resist System
- Novel Molecular Resist Based on Derivative of Cholic Acid
- 193-nm Photoresists Based on Norbornene Copolymers with Derivatives of Bile Acid
- Room Temperature Processable Organic-Inorganic Hybrid Photolithographic Materials Based on a Methoxysilane Cross-Linker
- A Novel Patterning Method of Low-resistivity Metals
- Poly(isobornyl methacrylate-co-3-(t-butoxycarbonyl)-1-vinyl-2-caprolactam) for an Environmentally Stable Chemically Amplified Resist
- Adhesion Enhancement of Norbornene Polymers with Lithocholate Substituents for 193-nm Resists
- Large Two-Beam Coupling in the p-PMEH-PPV/DPP/DO3/C_ : Atoms, Molecules, and Chemical Physics
- A Nonlinear Optical Polyurethane Functionalized with a Heteroaromatic Thiophene Ring Having a Tricyanovinyl Group
- Ethylene Polymerizations with Unsymmetrical (α-Diimine)nickel(II) Catalysts