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Department Of Ceramic Engineering Hanyang University | 論文
- The Influence of Cu and Au on Field Aided Lateral Crystallization of Amorphous Silicon Films
- Crystallization of Self-Implanted Amorphous Silicon Films : 招待講演I
- Cu-Field Aided Lateral Crystallization (FALC) of Amorphous Silicon Films below 450℃
- Cu-Field Aided Lateral Crystallization (FALC) of Amorphous Silicon Films below 450℃
- Evaluation of the Disadvantage of Radio Frequency Plasma Treatment on Polymer using Equivalent Circuit Model of Capacitor
- Electrical Characterization of Ferroelectric Pb(Zr, Ti)O3 Thin Films Deposited on Pt-Coated RuO2 Electrodes
- Cantilever Type Lead Zirconate Titanate Microactuator Utilizing Ruthenium Oxide
- イオン性固体中の電場下での物質移動のシミュレーション
- Atomic-scale simulations of early stage of oxidation of vicinal Si(001) surfaces using a reactive force-field potentials (Special issue: Dielectric thin films for future electron devices: science and technology)
- Electron accumulation in LaAlO3/SrTiO3 interfaces by the broken symmetry of crystal field (Special issue: Dielectric thin films for future electron devices: science and technology)
- Vitiligo Coexistent with Nevus Depigmentosus
- Electronic Properties of Nitrogen-Doped Carbon Nanotubes with Strain: Ab initio Method Approach
- Targeted IV busulfan and fludarabine followed by post-allogeneic hematopoietic cell transplantation rituximab demonstrate encouraging activity in CD20+ lymphoid malignancies without increased risk of infectious complications
- Effects of Calcination and Milling Process Conditions for Ceria Slurry on Shallow-Trench-Isolation Chemical–Mechanical Polishing Performance
- Nanotopography Impact of Surfactant Concentration and Molecular Weight of Nano-ceria Slurry on Remaining Oxide Thickness Variation after Shallow Trench Isolation Chemical Mechanical Polishing
- Reduction of Large Particles in Ceria Slurry by Aging and Selective Sedimentation and its Effect on Shallow Trench Isolation Chemical Mechanical Planarization
- Effect of Calcination Process on Synthesis of Ceria Particles, and Its Influence on Shallow Trench Isolation Chemical Mechanical Planarization Performance
- Effects of the Physical Characteristics of Cerium Oxide on Plasma-Enhanced Tetraethylorthosiliate Removal Rate of Chemical Mechanical Polishing for Shallow Trench Isolation
- The Effect of Cerium Precursor Agglomeration on the Synthesis of Ceria Particles and Its Influence on Shallow Trench Isolation Chemical Mechanical Polishing Performance
- Agglomerated Large Particles under Various Slurry Preparation Conditions and Their Influence on Shallow Trench Isolation Chemical Mechanical Polishing