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Department Of Ceramic Engineering Hanyang University | 論文
- 水酸化物を出発原料に用いたSrAl_2O_4系蛍光セラミックスの合成
- 高温耐酸化性保護膜を有するC/Cコンポジットの作製
- Field Aided Lateral Crystallization of Amorphous Silicon Thin Film
- Presence of human mycoplasma DNA in gastric tissue samples from Korean chronic gastritis patients
- Dependence of pH, Molecular Weight, and Concentration of Surfactant in Ceria Slurry on Saturated Nitride Removal Rate in Shallow Trench Isolation Chemical Mechanical Polishing
- Effects of Abrasive Size and Surfactant Concentration on the Non-Prestonian Behavior of Ceria Slurry in Shallow Trench Isolation Chemical Mechanical Polishing
- Effect of Molecular Weight of Surfactant in Nano Ceria Slurry on Shallow Trench Isolation Chemical Mechanical Polishing (CMP)
- Effects of Grain Size and Abrasive Size of Polycrystalline Nano-particle Ceria Slurry on Shallow Trench Isolation Chemical Mechanical Polishing
- Reduction of Large Particles in Ceria Slurry by Aging and Selective Sedimentation and its Effect on Shallow Trench Isolation Chemical Mechanical Planarization
- Effect of Calcination Process on Synthesis of Ceria Particles, and Its Influence on Shallow Trench Isolation Chemical Mechanical Planarization Performance
- Reduction of Large Particles in Ceria Slurry by Aging and Selective Sedimentation and its Effect on Shallow Trench Isolation Chemical Mechanical Planarization
- The Effect of Cerium Precursor Agglomeration on the Synthesis of Ceria Particles and Its Influence on Shallow Trench Isolation Chemical Mechanical Polishing Performance
- Agglomerated Large Particles under Various Slurry Preparation Conditions and Their Influence on Shallow Trench Isolation Chemical Mechanical Polishing
- A Reverse Selectivity Ceria Slurry for the Damascene Gate Chemical Mechanical Planarization Process
- Influence of Physical Characteristics of Ceria Particles on Polishing Rate of Chemical Mechanical Planarization for Shallow Trench Isolation
- Effect of Slurry Surfactant on Nanotopography Impact in Chemical Mechanical Polishing
- Effect of Forming Gas Anneal on the Properties of (Ba, Sr)RuO_3 and (Ba, Sr)TiO_3 : Semiconductors
- Analysis of Multilayer Structure for Reflection of Extreme-Ultraviolet Wavelength
- Effects of Physical Characteristics of Cerium Oxide of Plasma-Enhanced Tetraethylorthosiliate Removal Rate of Chemical Mechanical Polishing for Shallow Trench Isolation
- Effects of Abrasive Morphology and Surfactant Concentration on Polishing Rate of Ceria Slurry