スポンサーリンク
Central Research Laboratory, Hitacti, Ltd. | 論文
- Correlation of Nano Edge Roughness in Resist Patterns with Base Polymers
- Optical Performance of KrF Excimer Laser Lithography with Phase Shift Mask for Fabrication of 0.15 μm and Below
- Novel Process for Direct Delineation of Spin on Glass (SOG)
- Nanofabrication with Langmuir-Blodgett Films of a Chemical Amplification Resist SAL601
- Formation of Fractionated Novolak Resin Langmuir-Blodgett Films
- Fabrication of 0.1μm Complementary Metal-Oxide-Semiconductor Devices : Micro/nanofabrication and Devices
- Fabrication of 0.1μm Complementary Metal-Oxide-Semiconductor Devices
- 0.13 μm Pattern Delineation Using KrF Excimer Laser Light
- Algorithm for Phase-Shift Mask Design with Priority on Shifter Placement
- Phase-Shifting Technology for ULSI Patterning (Special Issue on Opto-Electronics and LSI)
- EB call projection Lithography : Lithography Technology
- Electron Beam Mask Fabrication for MOSLSI's with 1.5 μm Design Rule : A-1: ADVANCED LITHOGRAPHY AND PROCESS
- Electron Beam Enhanced Surface Photovoltage
- Fabrication of Deep Sub-μm Narrow-Channel Si-MOSFET's with Twofold-Gate Structures : Microfabrication and Physics
- A Novel Probe Size Measurement Method for a Fine Electron Beam : Inspection and Testing
- Effect of EB Acceleration Voltage and Beam Sharpness on Process Latitude of 0.2 μm Lines