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Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan | 論文
- Fragment Ions of Dimethylsilane Produced by Hot Tungsten Wires
- Temporal Evolution of Ion Fragment Production from Dimethylsilane by a Hot Tungsten Wire and Compounds Deposited on the Tungsten Surface
- Fragment Ions of Methylsilane Produced by Hot Tungsten Wires
- Sputtering Yields of CaO, SrO, and BaO by Monochromatic Noble Gas Ion Bombardment
- Extracellular Matrix Patterning for Cell Alignment by Atmospheric Pressure Plasma Jets
- Molecular Dynamics Simulations of Organic Polymer Dry Etching at High Substrate Temperatures
- Measurement of Magnesium Oxide Sputtering Yields by He and Ar Ions with a Low-Energy Mass-Selected Ion Beam System
- Arrangement of PC12 Cells on a Silicon Chip via Extracellular Matrix (ECM) Layer Patterning by Atmospheric Pressure Plasmas