Shinji Yokogawa | Advanced Device Development Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan
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- Yokogawa Shinjiの詳細を見る
- 同名の論文著者
- Advanced Device Development Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japanの論文著者
Advanced Device Development Division, NEC Electronics Corporation, 1120 Shimokuzawa, Sagamihara, Kanagawa 229-1198, Japan | 論文
- Suppression of Electromigration Early Failure of Cu/Porous Low-$k$ Interconnects Using Dummy Metal
- Comparison of Lifetime Improvements in Electromigration between Ti Barrier Metal and Chemical Vapor Deposition Co Capping
- Degradation of Electromigration Lifetime of Cu/Low-$k$ Interconnects by Postannealing
- Electromigration Lifetime Enhancement of CoWP Capped Cu Interconnects by Thermal Treatment
- Statistical Analysis of Lifetime Distribution of Time-Dependent Dielectric Breakdown in Cu/Low-$k$ Interconnects by Incorporation of Overlay Error Model