Sadoh Taizoh | Department of Electronics, Kyushu University, 6-10-1 Hakozaki, Fukuoka 812-8581, Japan

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概要

• Sadoh Taizohの詳細を見る
• 同名の論文著者
• Department of Electronics, Kyushu University, 6-10-1 Hakozaki, Fukuoka 812-8581, Japanの論文著者

関連著者

• Sadoh Taizoh

  Department Of Electronics Faculty Of Engineering Kyushu University

• Miyao Masanobu

  Department Of Electronics Kyushu University

• Sadoh Taizoh

  Department of Electronics, Kyushu University, 6-10-1 Hakozaki, Fukuoka 812-8581, Japan

• Yamashita Yoshimi

  Fujitsu Laboratories Ltd.

• Ikeda Keiji

  Fujitsu Laboratories Ltd.

• NINOMIYA Masaharu

  SUMCO

• NAKAMAE Masahiko

  SUMCO

• HAGINO Hiroyasu

  Analysis & Evaluation Center, Fukuryo Semicon Engineering Corporation

• KENJO Atsushi

  Department of Electrical Engineering,Faculty of Engineering,Kyushu University

• Matsuura Ryo

  Department Of Electronics Kyushu University

• Enokida Toyotsugu

  Analyses Of Evaluation Center Fukuryo Semicon Engineering Corporation

• Ohyama Yasuhiro

  Department of Electronics, Kyushu University, 6-10-1 Hakozaki, Fukuoka 812-8581, Japan

• Hagino Hiroyasu

  Analysis & Evaluation Center, Fukuryo Semicon Engineering Corporation, 1-1-1 Imajuku-Higashi, Fukuoka 819-0192, Japan

• Matsuura Ryo

  Department of Electronics, Kyushu University, 6-10-1 Hakozaki, Fukuoka 812-8581, Japan

• Ikeda Keiji

  Fujitsu Laboratories, 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan

• Nakamae Masahiko

  SUMCO, 2201 Oaza Kamioda, Kohoku-cho, Kishima-gun, Saga 849-0597, Japan

• Yamashita Yoshimi

  Fujitsu Laboratories Limited, 10-1 Morinosato-Wakamiya, Atsugi, Kanagawa 243-0197, Japan

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著作論文

• Suppression of Floating Body Effects in Polycrystalline Silicon Thin-Film Transistor by Schottky Source/Drain Structure
• Improvement of Oxidation-Induced Ge Condensation Method by H+ Implantation and Two-Step Annealing for Highly Stress-Relaxed SiGe-on-Insulator

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