OGATA Toshiyuki | New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd.
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概要
New Technology Development Section, Tokyo Ohka Kogyo Co., Ltd. | 論文
- Depth Profile and Line-Edge Roughness of Low-Molecular-Weight Amorphous Electron Beam Resists
- Molecular Resists Based on Cholate Derivatives for Electron-Beam Lithography
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography
- New Photoresist Based on Amorphous Low Molecular Weight Polyphenols
- Outgassing Characteristics of Low-Molecular-Weight Resists for Extreme Ultraviolet Lithography