TZENG Yu | Taiwan Semiconductor Manufacturing Co., Ltd.
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概要
Taiwan Semiconductor Manufacturing Co., Ltd. | 論文
- Plasma-Process-Induced Damage in Sputtered TiN Metal-Gate Capacitors with Ultrathin Nitrided Oxides
- Physical and Barrier Properties of Plasma Enhanced Chemical Vapor Deposition α-SiC : N : H Films
- Physical and Barrier Properties of Plasma-Enhanced Chemical Vapor Deposited α-SiC : H Films from Trimethylsilane and Tetramethylsilane
- Annealing Effect on Boron High-Energy-Ion-Implantation-Induced Defects in Si
- A Comparison of Behaviors between Hydrogenated/Unhydrogenated Polysilicon Thin Film Transistors under Electric Stress