Matsuo Tadashi | Toppan Printing Co., Lid.
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概要
Toppan Printing Co., Lid. | 論文
- X-Ray Mask Distortion Induced in Back-Etching Preceding Subtractive Fabrication: Resist and Absorber Stress Effect
- Reduction of X-Ray Irradiation-Induced Pattern Displacement of SiN Membranes Usirng H^+ Ion Implantation Technique
- Improvement in Radiation Stability of SiN X-Ray Mask Membranes
- Optically High Transparent SiN Mask Membrane with Low Stress Deposited by Low Pressure Chemical Vapor Deposition
- Charge Build-Up in Magnetron-Enhanced Reactive Ion Etching : Etching