Kalisch Holger | Gan Device Technology Rwth Aachen University
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概要
関連著者
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Kalisch Holger
Gan Device Technology Rwth Aachen University
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Vescan Andrei
Gan Device Technology Rwth Aachen University
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Grahn Holger
Paul-drude-institut Fur Festkorperelektronik
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JENICHEN Bernd
Paul-Drude-Institut fur Festkorperelektronik
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TRAMPERT Achim
Paul-Drude-Institut fur Festkorperelektronik
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Hahn Herwig
Gan Device Technology Rwth Aachen University
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Wan Qian
Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany
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WOITOK Joachim
PANalytical B.V.
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MAUDER Christof
GaN Device Technology, RWTH Aachen
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HEUKEN Michael
GaN Device Technology, RWTH Aachen
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Wang Kwang-Ru
Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany
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Jenichen Bernd
Paul-Drude-Institut für Festkörperelektronik, Hausvogteiplatz 5-7, 10117 Berlin, Germany
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LUKENS Gerrit
GaN Device Technology, RWTH Aachen University
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KETTENISS Nico
GaN Device Technology, RWTH Aachen University
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KALISCH Holger
GaN Device Technology, RWTH Aachen University
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VESCAN Andrei
GaN Device Technology, RWTH Aachen University
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Lukens Gerrit
Gan Device Technology Rwth Aachen University
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Ketteniss Nico
Gan Device Technology Rwth Aachen University
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WANG Kwang-Ru
Paul-Drude-Institut fur Festkorperelektronik
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Woitok Joachim
PANalytical B.V., P. O. Box 13, 7600 AA Almelo, The Netherlands
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WAN Qian
Paul-Drude-Institut fur Festkorperelektronik
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Vescan Andrei
GaN Device Technology, RWTH Aachen, Sommerfeldstr. 24, 52074 Aachen, Germany
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Kalisch Holger
GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany
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KALISCH Holger
GaN Device Technology, RWTH Aachen
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Reuters Benjamin
GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany
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Pooth Alexander
GaN Device Technology, RWTH Aachen University, 52074 Aachen, Germany
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Noculak Achim
Chair of Electromagnetic Theory, RWTH Aachen University, 52074 Aachen, Germany
著作論文
- Recessed-Gate Enhancement-Mode AlGaN/GaN Heterostructure Field-Effect Transistors on Si with Record DC Performance
- Formation of a Monocrystalline, M-Plane AlN Layer by the Nitridation of \gamma-LiAlO2(100)
- Formation of a Monocrystalline, M-Plane AlN Layer by the Nitridation of γ-LiAlO_2(100)
- First Small-Signal Data of GaN-Based p-Channel Heterostructure Field Effect Transistors