Zhu Chunxiang | Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University
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Silicon Nano Device Lab (sndl) Department Of Electrical And Computer Engineering National University | 論文
- Behavior of Effective Work Function in Metal/High-K Gate Stack under High Temperature Process
- Dependence of Chemical Composition Ratio on Electrical Properties of HfO_2-Al_2O_3 Gate Dielectric
- Dependence of Chemical Composition Ratio on Electrical Properties of HfO2–Al2O3 Gate Dielectric
- Investigation of Quasi-Breakdown Mechanism through Post-Quasi-Breakdown Thermal Annealing
- Top-Surface Aluminized and Nitrided Hafnium Oxide Using Synthesis of Thin AlN and HfO_2 Stacked Layer