Ishihara Sunao | The University Of Tokyo
スポンサーリンク
概要
関連著者
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Ishihara Sunao
The University Of Tokyo
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Kometani Reo
The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8658, Japan
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Nagase Masao
Ntt Basic Research Laboratories
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YAMAGUCHI Hiroshi
NTT Basic Research Laboratories
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Tamaru Kojiro
NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Nonaka Keiichiro
NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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NAKATAKE Shigetoshi
University of Kitakyushu
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Yamabe Masaki
Aset
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Inoue Tadao
Aset
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ICHIHASHI Toshinari
NEC Corporation, Fundamental Research Laboratories
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KATO Kokoro
ASET
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ENDO Masakazu
ASET
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Reo Kometani
The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8658, Japan
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Kometani Reo
The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Ishihara Sunao
The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8658, Japan
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Ishihara Sunao
The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Sunao Ishihara
The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8658, Japan
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Ishihara Sunao
The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
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Ishihara Sunao
The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Guo Dengji
The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Ichihashi Toshinari
NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305-8501, Japan
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Nagase Masao
NTT Basic Research Laboratories, 3-1 Morinosato Wakamiya, Atsugi, Kanagawa 243-0198, Japan
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Warisawa Shin'ichi
The University of Tokyo, Bunkyo, Tokyo 113-8656, Japan
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Warisawa Shin'ichi
The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8658, Japan
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Warisawa Shin'ichi
The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Shin'ichi Warisawa
The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8658, Japan
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Warisawa Shin'ichi
The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan
著作論文
- Graphite Shell Film Formation Induced by Eduction Phenomenon of Ga Implanted by Focused Ion Beam
- Photomask Data Prioritization Based on VLSI Design Intent and Its Utilization for Mask Manufacturing
- Non-Core–Shell Nanostructure Deposition on Focused-Ion-Beam Chemical Vapor Deposition
- Three-Dimensional Nanostructure Fabrication by Controlling Downward Growth on Focused-Ion-Beam Chemical Vapor Deposition
- Evaluation of Thermal–Mechanical Vibration Amplitude and Mechanical Properties of Carbon Nanopillars Using Scanning Electron Microscopy
- Height Dependence of Young's Modulus for Carbon Nanopillars Grown by Focused-Ion-Beam-Induced Chemical Vapor Deposition