Non-Core–Shell Nanostructure Deposition on Focused-Ion-Beam Chemical Vapor Deposition
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概要
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Nano- and microstructures fabricated by focused-ion-beam chemical vapor deposition (FIB-CVD) have a core–shell structure caused by the scattering profiles of Ga ions and secondary electrons (SEs). This structural characteristic makes it difficult to design functions of nano-electromechanical devices. Therefore, non-core–shell structure deposition by the control of SE emission was examined to facilitate the function design of nanoelectromechanical devices. Non-core–shell structure deposition was achieved by applying voltage during carbon nanostructure growth. We also evaluated the growth characteristics of non-core–shell structure deposition. We found that the growth rate of a nanostructure did not change when voltage was applied. Furthermore, we evaluated the mechanical material characteristics (density and Young’s modulus) of a non-core–shell structure by measuring of the resonant frequency shift of a Si cantilever using the electron beam method. We found that the non-core–shell structure had a high density (6.5 g/cm3) and a high Young’s modulus (800 GPa). These results indicate that the technique for non-core–shell structure deposition is useful in achieving nanoelectromechanical devices.
- 2010-06-25
著者
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Ishihara Sunao
The University Of Tokyo
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Kometani Reo
The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8658, Japan
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Reo Kometani
The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8658, Japan
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Sunao Ishihara
The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8658, Japan
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Shin'ichi Warisawa
The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8658, Japan
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