Semura Shigeru | Transmission Media R&d Department Yokohama Research Laboratories Sumitomo Electric Industries
スポンサーリンク
概要
- 同名の論文著者
- Transmission Media R&d Department Yokohama Research Laboratories Sumitomo Electric Industriesの論文著者
関連著者
-
Semura Shigeru
Transmission Media R&d Department Yokohama Research Laboratories Sumitomo Electric Industries
-
NAKASHIMA Hisao
Optoelectronics Joint Research Laboratory
-
Ohta Tsuneaki
Optoelectronics Joint Research Laboratory
-
Ohta Tuneaki
Oki Electric Industry Co. Ltd.
-
Ohta Tsuneaki
Oki Ekectric Industry Co. Ltd.
-
Ohta Tsuneaki
Oki Electric Industry Co. Ltd.
-
Ohta T
Matsushita Electric Industrial Co. Ltd. Osaka Jpn
-
Nakashima Hideharu
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
-
Semura Shigeru
Optoelectronics Joint Research Laboratory
-
Nakashima H
Osaka Univ. Osaka Jpn
-
Kuroda Takao
Optoelectronics Joint Research Laboratory
-
Kuroda T
Central Research Laboratory Hitachi Ltd.
-
Ishida Koichi
Optoelectronics Joint Research Laboratory:(present Address) Fundamental Research Laboratories Nec Co
-
Ishida Koichi
Optoelectronics Joint Research Laboratory
-
Hattori Tetsuya
Transmission Media R&d Department Yokohama Research Laboratories Sumitomo Electric Industries
-
Akasaka N
High Energy Accelerator Res. Organization (kek) Ibaraki Jpn
-
AKASAKA Nobuhiro
Transmission Media R&D Department, Yokohama Research Laboratories, Sumitomo Electric Industries
-
Akasaka Nobuhiro
Transmission Media R&D Department, Yokohama Research Laboratories, Sumitomo Electric Industries
著作論文
- AlGaAs Window Stripe Buried Multiquantum Well Lasers
- Cross Sectional Transmission Electron Microscopy of Zn Diffusion Induced Disordering of GaAlAs-GaAs Multiquantum-Well Structures
- AlGaAs/GaAs Multiquantum Well Lasers with Buried Multiquantum Well Optical Guide
- AlGaAs/GaAs Buried Multiquantum Well Lasers with a Reactive Ion Etched Window Facet
- Inductively Coupled Plasma-Enhanced Chemical Vapor Deposition of SiO_2 and GeO_2-SiO_2 Films for Optical Waveguides Using Tetraethylorthosilicate and Tetramethylgermanium