Hamada Tomoyuki | The Fsis Center For Collaborative Research Institute Of Industrial Science University Of Tokyo
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概要
- HAMADA Tomoyukiの詳細を見る
- 同名の論文著者
- The Fsis Center For Collaborative Research Institute Of Industrial Science University Of Tokyoの論文著者
関連著者
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INOUE Minoru
TAIYO NIPPON SANSO CORPORATION
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HASAKA Satoshi
TAIYO NIPPON SANSO CORPORATION
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Ohno Takahisa
First Principles Simulation Group Computational Materials Science Center National Institute For Mate
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Hamada Tomoyuki
The Fsis Center For Collaborative Research Institute Of Industrial Science University Of Tokyo
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Tajima Nobuo
First Principles Simulation Group Computational Materials Science Center National Institute For Mate
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Yoneda Katsumi
Semiconductor Leading Edge Technologies Inc. (selete)
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TAJIMA Nobuo
First Department of Internal Medicine, Nagasaki University School of Medicine
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Kobayashi Nobuyoshi
Semiconductor Leading Edge Technologies Inc. (selete)
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Kobayashi Nobuyoshi
Semiconductor & Integrated Circuits Div. Hitachi Ltd.
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Ohno T
National Research Institute For Metals
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Ohno Takahisa
National Institute For Materials Science
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Ohno Takahisa
Computational Materials Science Center National Institute For Materials Science
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Ohno Takahisa
National Research Institute For Metals
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TAJIMA Nobuo
First Principles Simulation Group, Computational Materials Science Center, National Institute for Ma
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HAMADA Tomoyuki
The FSIS Center for Collaborative Research, Institute of Industrial Science, University of Tokyo
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OHNO Takahisa
First Principles Simulation Group, Computational Materials Science Center, National Institute for Ma
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YONEDA Katsumi
Semiconductor Leading Edge Technologies, Inc. (Selete)
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SHINRIKI Manabu
Taiyo Nippon Sanso Corporation
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MIYAZAWA Kazuhiro
Taiyo Nippon Sanso Corporation
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SAKOTA Kaoru
Taiyo Nippon Sanso Corporation
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Kondo Seiichi
Semiconductor Leading Edge Technologies Inc. (selete)
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Ohno Takahisa
Science University Of Tokyo
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KONDO Seiichi
Semiconductor Leading Edge Technologies, Inc. (Selete)
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YONEDA Katsumi
Research Dept. 1, Semiconductor Leading Edge Technologies, Inc. (Selete)
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KOBAYASHI Nobuyoshi
Research Dept. 1, Semiconductor Leading Edge Technologies, Inc. (Selete)
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Hamada Tomoyuki
The FSIS Center for Collaborative Research, Institute of Industrial Science, University of Tokyo, 4-6-1 Komaba, Meguro-ku, Tokyo 153-8505, Japan
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Kobayashi Nobuyoshi
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Kobayashi Nobuyoshi
Research Department 1, Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
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Inaishi Yoshiaki
Taiyo Nippon Sanso Corporation, Toyo Bldg., 1-3-26 Koyama, Shinagawa-ku, Tokyo 142-8558, Japan
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Ohno Takahisa
First Principles Simulation Group, Computational Materials Science Center, National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
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Inoue Minoru
Taiyo Nippon Sanso Corporation, Toyo Bldg., 1-3-26 Koyama, Shinagawa-ku, Tokyo 142-8558, Japan
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Tajima Nobuo
First Principles Simulation Group, Computational Materials Science Center, National Institute for Materials Science, 1-2-1 Sengen, Tsukuba, Ibaraki 305-0047, Japan
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Yoneda Katsumi
Semiconductor Leading Edge Technologies, Inc. (Selete), 16-1 Onogawa, Tsukuba, Ibaraki 305-8569, Japan
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Yoneda Katsumi
Research Department 1, Semiconductor Leading Edge Technologies, Inc., Tsukuba, Ibaraki 305-8569, Japan
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Shinriki Manabu
Taiyo Nippon Sanso Corporation, Toyo Bldg., 1-3-26 Koyama, Shinagawa-ku, Tokyo 142-8558, Japan
著作論文
- SiOCH Films with Hydrocarbon Network Bonds : First-Principles Investigation
- Hydrocarbon Groups and Film Properties of SiOCH Dielectrics : Theoretical Investigations using Molecular Models
- Carbon-Doped Silicon Oxide Films with Hydrocarbon Network Bonds for Low-$k$ Dielectrics: Theoretical Investigations