Yanagisawa Michihiko | Department Of Material Science School Of Engineering University Of Tokyo
スポンサーリンク
概要
関連著者
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Horiike Yasuhiro
Department Of Electrical & Electronics Engineering Tokyo University
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Yanagisawa Michihiko
Department Of Material Science School Of Engineering University Of Tokyo
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HORIIKE Yasuhiro
Department of Electrical Engineering, Toyo University
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Iida S
Toyama Univ. Toyama Jpn
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Iida Shinya
Speedfam Co. Ltd.
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YANAGISAWA Michihiko
Department of Material Science, School of Engineering, University of Tokyo
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Ogawa Hiroki
Department Of Electrical And Computer Engineering Nagoya Institute Of Technology:(present Address) N
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HORIIKE Yasuhiro
Department of Material Science, School of Engineering, University of Tokyo
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Yanagisawa Michihiko
Department of Material Science, School of Engineering, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
著作論文
- Numerically Controlled Dry Etching Technology for Flattening of Si Wafer which Employs SF_6/H_2 Downstream Plasma
- Mechanism of Cloudy Surface Generation on Si Wafer Employing Numerically Controlled Local Dry Etching (NC-LDE)