Furukawa K | High Energy Accelerator Res. Organization (kek) Ibaraki Jpn
スポンサーリンク
概要
関連著者
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Muraoka Katsunori
Interdisciplinary Gt-aduate School Of Engineering Sciences Kyushu Universit
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Muraoka Katsunori
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Matsuo Keiji
Fukuoka Institute Of Technology
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NAKASHIMA Hiroshi
Advanced Science and Technology Center for Cooperative Research, Kyushu University
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FURUKAWA Kazuo
Department of Physics, Faculty of Science, Kagoshima Unviersity
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Nakashima Hiroshi
Department Of Preventive Medicine And Public Health National Defense Medical College
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FURUKAWA Katsuhiko
Advanced Science and Technology Center for Cooperative Research, Kyushu University
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Nakashima H
Hyogo University
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Nakashima Hideharu
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Furukawa K
High Energy Accelerator Res. Organization (kek) Ibaraki Jpn
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Furukawa Katsuhiko
Advanced Science And Technology Center For Cooperative Research Kyushu University
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Nakashima Hiroshi
Advanced Science And Technology Center For Cooperative Research Kyushu University
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Nakashima Hiroshi
Advanced Science and Technology Center for Cooperative
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Wang Jun
National Institute Of Materials And Chemical Research
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Gao D
Advanced Science And Technology Center For Cooperative Research Kyushu University
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Wang J
State Key Laboratory Of Crystal Materials Shandong University
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Wang J
Interdisciplinary Gt-aduate School Of Engineering Sciences Kyushu University
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GAO Junsi
Interdisciplinary GT-aduate School of Engineering Sciences, Kyushu University
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WANG Junli
Interdisciplinary GT-aduate School of Engineering Sciences, Kyushu University
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Gao J
Huazhong Univ. Sci. & Technol. Wuhan Chn
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Gao Dawei
Advanced Science And Technology Center For Cooperative Research Kyushu University
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IWANAGA Kanako
Interdisciplinary GT-aduate School of Engineering Sciences, Kyushu University
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Itani K
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Iwanaga Kanako
Interdisciplinary Gt-aduate School Of Engineering Sciences Kyushu University
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Sakai Naomichi
International Superconductivity Technology Center Superconductivity Research Laboratory
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Ikeda K
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Sakai Naomichi
Superconductivity Research Laboratory Istec-srl
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IKEDA Ken-ichi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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NAKASHIMA Hideharu
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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Ikeda Ken-ichi
Bio-oriented Technology Research Advancement Institution National Institute For Agro-environmental S
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Liu Y‐c
Advanced Science And Technology Center For Cooperative Research Kyushu University
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Ikeda Ken‐ichi
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Sakai Naofumi
Superconductivity Research Laboratory Istec-srl
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SAKAI Naofumi
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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GAO Da-Wei
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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KASHIWAZAKI Yasuhiro
Interdisciplinary Graduate School of Engineering Sciences, Kyushu University
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LIU Yi-Chun
Advanced Science and Technology Center for Cooperative Research, Kyushu University
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TSURUSHIMA Toshio
Graduate School of Information Science and Electrical Engineering, Kyushu University
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Kashiwazaki Yasuhiro
Interdisciplinary Graduate School Of Engineering Sciences Kyushu University
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Liu Yi-chun
Advanced Science And Technology Center For Cooperative Research Kyushu University
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Tsurushima T
Graduate School Of Information Science And Electrical Engineering Kyushu University
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Tsurushima Toshio
Graduate School Of Information Science And Electrical Engineering Kyushu University
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Ikeda Ken-ichi
Department Of Electrical And Materials Science Faculty Of Engineering Sciences Kyushu University
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Ikeda Ken-ichi
Bio-oriented Technology Research Advancement Institution National Institute For Agro-environmental S
著作論文
- Optimum Discharge Condition of DC Bias Electron Cyclotron Resonance Plasma Sputtering for High Quality Si Epitaxial Growth
- Effect of Substrate Bias on Si Epitaxial Growth Using Sputtering-Type Electron Cyclotron Resonance (ECR) Plasma
- Room Temperature Deposition of Silicon Nitride Films for Passivation of Organic Electroluminescence Device Using a Sputtering-Type Electron Cyclotron Resonance Plasma
- Growth of Epitaxial Silicon Film at Low Temperature by Using Sputtering-Type Electron Cyclotron Resonance Plasma
- Deposition of High-Quality Silicon Oxynitride Film at Low Temperature by Using a Sputtering-Type Electron Cyclotron Resonance Plasma