Tabe Michiharu | Ntt Lsi Laboratories Nippon Telegraph And Telephone Corporation
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Ntt Lsi Laboratories Nippon Telegraph And Telephone Corporation | 論文
- Influence of Effective Masses on the Oscillation of Fowler-Nordheim Tunneling in Thin SiO_2 MOS Capacitors
- Measurememt of Ge/Si Ratio of SiGe-Layer on Si Substrate Using Total-Reflection X-Ray Fluorescence
- Impact of Negative-Bias Temperature Instability on the Lifetime of Single-Gate CMOS Structures with Ultrathin (4–6 nm) Gate Oxides
- Impact of Negative-Bias Temperature Instability on the Lifetime of Single-Gate CMOS Structures with Ultrathin(4-6nm)Gate Oxides
- Electron Trapping Inducedby High-Energy Ionizing Radiation in SiO_2