Kinoshita Y | Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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概要
関連著者
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Kinoshita Y
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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KINOSHITA Yoshitaka
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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TAKEZOE Hideo
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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PARK Byoungchoo
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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Watanabe Junji
Department of Cardiology, Yokkaichi Municipal Hospital
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Takezoe Hideo
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Park Byoungchoo
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Kinoshita Yoshitaka
Department Of Electrical Engineering Hokkaido University
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KINOSHITA Yoshitaka
Department of Chemistry and Biotechnology, Graduate School of Engineering, Tottori University
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ISHIKAWA Ken
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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石川 賢司
四日市大学総合政策学部
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Watanabe Junji
Department Of Cardiology Yokkaichi Municipal Hospital
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Ishikawa Ken
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Watanabe Junji
Department Of Applied Chemistry Graduate School Of Engineering Osaka University
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ISHIKAWA Ken
Department of Applied Physics, University of Tokyo
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EBISU Shuji
Department of Materials Science and Engineering, Muroran Institute of Technology
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NAGATA Shoichi
Department of Materials Science and Engineering, Muroran Institute of Technology
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石川 賢司
静大電子研
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Ebisu Shuji
Dep. Of Materials Sci. And Engineering Muroran Inst. Of Technol. 27-1 Mizumoto-cho Muroran Hokkaido
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Ebisu Shuji
Department Of Applied Materials Science Muroran Institute Of Technology
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Nagata Shoichi
Dep. Of Materials Sci. And Engineering Muroran Inst. Of Technol. 27-1 Mizumoto-cho Muroran Hokkaido
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Nagata Shoichi
Muroran Inst. Technol. Hokkaido Jpn
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ARAOKA Fumito
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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CHOI Suk-Won
Department of Organic & Polymeric Materials, Tokyo Institute of Technology
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Ishikawa K
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Nagata S
Osaka Univ.
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Sakai T
Tokyo Inst. Technol. Kanagawa Jpn
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INUISHI Masahide
ULSI Laboratory, Mitsubishi Electric Corporation
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TSUBOUCHI Natsuro
ULSI Laboratory, Mitsubishi Electric Corporation
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Sakai Takahiro
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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INUISHI Masahide
Advanced Device Development Dept., Renesas Technology Corp.
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Yoo J‐g
Samsung Display Devices Suwon Kor
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Choi S‐w
Department Of Organic & Polymeric Materials Tokyo Institute Of Technology
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Araoka Fumito
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Sakai Tomohiro
Department Of Innovative And Engineered Materials Interdisciplinary Graduate School Of Science And E
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Nagata Shoichi
Department Of Applied Material Science Muroran Institute Of Technology
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KUROI Takashi
ULSI Development Center, Mitsubishi Electric Corporation
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HOSHI Hajime
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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Tsukamoto K
Univ. Tokyo Tokyo Jpn
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Sakai T
Dainippon Screen Manufacturing Co. Ltd. Kyoto Jpn
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Hasebe H
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
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YOO Jeong-Geun
Department of Organic and Polymeric Materials, Tokyo Institute of Technology
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KINOSHITA Yasuhiro
Department of Applied Materials Science, Muroran Institute of Technology
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CHIKAZAWA Susumu
Department of Applied Materials Science, Muroran Institute of Technology
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Thisayukta Jirakorn
Department Of Organic And Polymeric Materials Graduate School Of Science And Engineering Tokyo Insti
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Thisayukta Jirakorn
(現)東工大
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Chikazawa Susumu
Department Of Applied Material Science Muroran Institute Of Technology
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Tsubouchi Natsuro
Lsi Research And Development Laboratory Mitusbishi Electric Corporation
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Tsubouchi Natsuro
Ulsi Development Center Mitsubishi Electric Corporation
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Hoshi Hajime
Department Of Anatomy Nihon University School
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Kuroi T
Ulsi Development Center Mitsubishi Electric Corporation
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Kuroi Takashi
Ulsi Development Center Mitsubishi Electric Corporation
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Nagata S
Tohoku University
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Nasu Shoichi
Kanazawa Institute Of Technology
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Kawasaki Y
Mie Univ. Mie Jpn
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Chikazawa S
Muroran Inst. Technol. Muroran Jpn
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Kinoshita Yasushi
ULSI Laboratory, Mitsubishi Electric Corporation
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NIORI Teruki
Department of Polymer Chemistry, Tokyo Institute of Technology
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Niori Teruki
Department Of Polymer Chemistry Tokyo Institute Of Technology
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Kinoshita Yasushi
Ulsi Laboratory Mitsubishi Electric Corporation
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Tsubouchi N
Ulsi Dev. Center Hyogo Jpn
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Tsukamoto K
Ulsi Laboratory Mitsubishi Electric Corporation
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KAWASAKI Youji
ULSI Laboratory, Mitsubishi Electric Corporation
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ISHIGAKI Yoshiyuki
ULSI Laboratory, Mitsubishi Electric Corporation
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TSUKAMOTO Katsuhiro
ULSI Laboratory, Mitsubishi Electric Corporation
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Sakai T
Laboratory Of Plant Cell Biochemistry Department Of Applied Plant Science Division Of Life Science G
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Inuishi Masahide
Advanced Device Development Dept. Renesas Technology Corp.
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Inuishi Masahide
Ulsi Development Center Mitsubishi Electric Corporation
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Kinoshita Y
Nippon Paint Co. Ltd. Tokyo Jpn
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Sakai Takahiro
Department Of Laboratory Animal Science The Tokyo Metropolitan Institute Of Medical Science (rinshok
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Sakai Toshikatsu
School Of Science And Engineering Waseda University:crest Japan Science And Technology Corporation (
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Sakai Takahiro
Department Of Bioscience And Biotechnology Faculty Of Engineering Okayama University
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Ishigaki Yoshiyuki
Ulsi Laboratory Mitsubishi Electric Corporation
著作論文
- Determination of Molecular Orientational Distribution Using Surface Second-Harmonic Generation Analyzed by the Five-Layer Model and the Modified Maximum -Entropy Method
- Suppression of Diamagnetic Susceptibility in Extremely Thin Cylindrical Superconductor
- Evaluation of the First-Order Hyperpolarizability Tensor of Bent Molecules by Means of Hyper-Rayleigh Scattering Method
- Second-Harmonic Generation in Achiral Bent-Shaped Liquid Crystals
- Ferroelectricity in the Lyotropic Cholesteric Phase of Poly L-Glutamate
- Bipolar Transistor with a Buried Layer Formed by High-Energy Ion Implantation for Subhalf-Micron Bipolar-Complementary Metal Oxide Semiconductor LSIs