Toyoda Satoshi | Department Of Applied Chemistry Graduate School Of Engineering The University Of Tokyo
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概要
関連著者
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Toyoda Satoshi
Department Of Applied Chemistry Graduate School Of Engineering The University Of Tokyo
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Oshima Masaharu
Department Of Applied Chemistry Graduate School Of Engineering The University Of Tokyo
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OSHIMA Masaharu
Department of Applied Chemistry and JST-CREST, The University of Tokyo
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OSHIMA Masaharu
Department of Engineering, University of Tokyo
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TOYODA Satoshi
Department of Applied Chemistry, Graduate School of Engineering, The University of Tokyo
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Kadomura Shingo
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Iwamoto Hayato
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Hirano Tomoyuki
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Tai Kaori
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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Yamaguchi Shinpei
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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ANDO Takashi
Department of Neurosurgery, Asahi University Murakami Memorial Hospital
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KUMIGASHIRA Hiroshi
Department of Physics,Tohoku University
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SHIMOGAKI Yukihiro
Department of Materials Engineering, The University of Tokyo
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WATANABE Heiji
Department of Precision Science and Technology, Osaka University
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Kumigashira Hiroshi
Department Of Applied Chemistry Graduate School Of Engineering The University Of Tokyo
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SHIMURA Takayoshi
Department of Material and Life Science, Graduate School of Engineering, Osaka University
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HIRANO Tomoyuki
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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YOSHIDA Shinichi
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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TAI Kaori
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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YAMAGUCHI Shinpei
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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IWAMOTO Hayato
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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KADOMURA Shingo
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation
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Oshima Masaharu
Department Of Applied Chemistry The University Of Tokyo
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Ando Takashi
Department Of Internal Medicine And Pathophysiology Nagoya City University Graduate School Of Medica
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He Gang
Department Of Applied Chemistry The University Of Tokyo
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Toyoda Satoshi
Department Of Applied Chemistry The University Of Tokyo
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Watanabe Heiji
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Shimogaki Yukihiro
Department Of Materials Engineering Faculty Of Engineering Univerity Of Tokyo
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Shimura Takayoshi
Graduate School Of Engineering Osaka University
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Shimura Takayoshi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Ando Takashi
Department Of Immunology Faculty Of Medicine University Of Yamanashi
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Ando Takashi
Department Of Material And Life Science Graduate School Of Engineering Osaka University
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Ando Takashi
Department Of Applied Biological Chemistry Graduate School Of Agricultural And Life Sciences Univers
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Yoshida Shinichi
Semiconductor Technology Development Division Semiconductor Business Group Sony Corporation
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KUMIGASHIRA Hiroshi
Department of Applied Chemistry and JST-CREST, The University of Tokyo
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Kadomura Shingo
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Oshiyama Itaru
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Tanaka Kazuaki
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Hagimoto Yoshiya
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Uemura Takayuki
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Ando Takashi
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Watanabe Koji
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Yamamoto Ryo
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Kanda Saori
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Wang Junli
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Tateshita Yasushi
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Wakabayashi Hitoshi
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Tagawa Yukio
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Tsukamoto Masanori
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Saito Masaki
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Nagashima Naoki
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Hirano Tomoyuki
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Yamaguchi Shinpei
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Toyoda Satoshi
Department of Applied Chemistry, School of Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, Tokyo 113-8656, Japan
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Iwamoto Hayato
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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Tai Kaori
Semiconductor Technology Development Division, Semiconductor Business Group, Sony Corporation, 4-14-1 Asahi-cho, Atsugi, Kanagawa 243-0014, Japan
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SHIMOGAKI YUKIHIRO
Department of Chemical Engineering, University of Tokyo
著作論文
- Mechanism of Carrier Mobility Degradation Induced by Crystallization of HfO_2 Gate Dielectrics
- Chemical Bonding States and Band Alignment of Ultrathin AlOxNy/Si Gate Stacks Grown by Metalorganic Chemical Vapor Deposition
- Tinv Scaling and Gate Leakage Reduction for n-Type Metal Oxide Semiconductor Field Effect Transistor with HfSix/HfO2 Gate Stack by Interfacial Layer Formation Using Ozone–Water-Last Treatment