Kiuchi Masato | Center For Atomic And Molecular Technologies Graduate School Of Engineering Osaka University
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概要
- 同名の論文著者
- Center For Atomic And Molecular Technologies Graduate School Of Engineering Osaka Universityの論文著者
関連著者
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Hamaguchi Satoshi
Center For Atomic And Molecular Technologies Graduate School Of Engineering Osaka University
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Kiuchi Masato
Center For Atomic And Molecular Technologies Graduate School Of Engineering Osaka University
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YOSHIMURA Satoru
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
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TOH Akinori
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
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SUGIMOTO Satoshi
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University
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Nishitani Mikihiko
Image Devices Development Center, Matsushita Electric Industrial Co., Ltd., 3-1-1 Yagumo-naka-machi, Moriguchi, Osaka 570-8501, Japan
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Terauchi Masaharu
Image Devices Development Center, Matsushita Electric Industrial Co., Ltd., 3-1-1 Yagumo-naka-machi, Moriguchi, Osaka 570-8501, Japan
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Hine Kiyohiro
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Hashimoto Jun
Image Devices Development Center, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
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Hine Kiyohiro
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Toh Akinori
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Nishitani Mikihiko
Image Devices Development Center, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
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Sugimoto Satoshi
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Yoshimura Satoru
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Yoshimura Satoru
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Hamaguchi Satoshi
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Terauchi Masaharu
Image Devices Development Center, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
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Honda Yosuke
Image Devices Development Center, Panasonic Corporation, Moriguchi, Osaka 570-8501, Japan
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Ikuse Kazumasa
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Kiuchi Masato
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Kiuchi Masato
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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Maeda Takuya
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, 2-1 Yamadaoka, Suita, Osaka 565-0871, Japan
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Hamaguchi Satoshi
Center for Atomic and Molecular Technologies, Graduate School of Engineering, Osaka University, Suita, Osaka 565-0871, Japan
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HONDA Yosuke
Image Devices Development Center, Panasonic Corp.
著作論文
- Temporal Evolution of Ion Fragment Production from Dimethylsilane by a Hot Tungsten Wire and Compounds Deposited on the Tungsten Surface
- Fragment Ions of Dimethylsilane Produced by Hot Tungsten Wires
- Fragment Ions of Dimethylsilane Produced by Hot Tungsten Wires
- Temporal Evolution of Ion Fragment Production from Dimethylsilane by a Hot Tungsten Wire and Compounds Deposited on the Tungsten Surface
- Fragment Ions of Methylsilane Produced by Hot Tungsten Wires
- Sputtering Yields of CaO, SrO, and BaO by Monochromatic Noble Gas Ion Bombardment
- Measurement of Magnesium Oxide Sputtering Yields by He and Ar Ions with a Low-Energy Mass-Selected Ion Beam System