Kodera Masako | Process & Manufacturing Engineering Center Toshiba Corp.

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概要

• Kodera Masakoの詳細を見る
• 同名の論文著者
• Process & Manufacturing Engineering Center Toshiba Corp.の論文著者

関連著者

• Kodera Masako

  Process & Manufacturing Engineering Center Toshiba Corp.

• Naka Nobuyuki

  Horiba Ltd.

• MOCHIZUKI Yoshihiro

  Ebara Research Corp.

• FUKUDA Akira

  Ebara Research Corp.

• Tsuchiya Norihiko

  Process And Manufacturing Engineering Center Toshiba Semiconductor Company

• Iguchi Tadashi

  Process And Manufacturing Engineering Center Toshiba Semiconductor Company

• TAMURA Mizuki

  Toshiba I. S. Corp.

• Kashiwagi Shinsuke

  Horiba Ltd.

• Miyashita Naoto

  Oita Operations Toshiba Corp.

• Kakinuma Shigeru

  Horiba Ltd.

• Tsujimura Manabu

  Ebara Corp.

• Matsui Yoshitaka

  Yokkaitchi Operations Toshiba Corp.

• Hiyama Hirokuni

  Ebara Corporation, Fujisawa, Kanagawa 251-8502, Japan

• TSUJIMURA Manabu

  Ebara Corporation, Precision Machinery Company, Semiconductor Equipment Division

• KODERA Masako

  Process and Manufacturing Engineering Center, Toshiba Semiconductor Company

• HIYAMA Hirokuni

  Ebara Research Corp.

• KAKINUMA Shigeru

  Horiba, Ltd.

• KASHIWAGI Shinsuke

  Horiba, Ltd.

• MATSUI Yoshitaka

  Yokkaitchi Operations, Toshiba Corp.

• MIYASHITA Naoto

  Oita Operations, Toshiba Corp.

• Naka Nobuyuki

  HORIBA, Ltd., 2 Miyanohigashi, Kisshoin, Minami-ku, Kyoto 601-8510, Japan

• Iguchi Tadashi

  Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

• Kashiwagi Shinsuke

  HORIBA, Ltd., 2 Miyanohigashi, Kisshoin, Minami-ku, Kyoto 601-8510, Japan

• Kakinuma Shigeru

  HORIBA, Ltd., 2 Miyanohigashi, Kisshoin, Minami-ku, Kyoto 601-8510, Japan

• Kodera Masako

  Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

• Tamura Mizuki

  Toshiba I. S. Corp., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

• Tsujimura Manabu

  Ebara Corp., 4-2-1 Honfujisawa, Fujisawa, Kanagawa 251-8502, Japan

• Hiyama Hirokuni

  Ebara Research Corp., 4-2-1 Honfujisawa, Fujisawa, Kanagawa 251-8502, Japan

• Mochizuki Yoshihiro

  Ebara Research Corp., 4-2-1 Honfujisawa, Fujisawa, Kanagawa 251-8502, Japan

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著作論文

• Shear Stress Analyses in Chemical Mechanical Planarization Processing with Cu/porous low-k Structure
• Nano-Scale Stress Field Evaluation with Shallow Trench Isolation Structure Assessed by Cathodoluminescence, Raman Spectroscopy, and Finite Element Method Analyses
• Wet cleaning processing of VLSI devices by functional waters (電子デバイス)
• Nanoscale Stress Field Evaluation with Shallow Trench Isolation Structure Assessed by Cathodoluminescence Spectroscopy, Raman Spectroscopy, and Finite Element Method Analyses
• Wet Cleaning Processing of VLSI Devices by Functional Waters
• Shear Stress Analyses in Chemical Mechanical Planarization with Cu/Porous Low-$k$ Structure

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