Kodera Masako | Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

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概要

• Kodera Masakoの詳細を見る
• 同名の論文著者
• Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japanの論文著者

関連著者

• Naka Nobuyuki

  Horiba Ltd.

• Kodera Masako

  Process & Manufacturing Engineering Center Toshiba Corp.

• Tsuchiya Norihiko

  Process And Manufacturing Engineering Center Toshiba Semiconductor Company

• Iguchi Tadashi

  Process And Manufacturing Engineering Center Toshiba Semiconductor Company

• TAMURA Mizuki

  Toshiba I. S. Corp.

• Kashiwagi Shinsuke

  Horiba Ltd.

• Kakinuma Shigeru

  Horiba Ltd.

• Naka Nobuyuki

  HORIBA, Ltd., 2 Miyanohigashi, Kisshoin, Minami-ku, Kyoto 601-8510, Japan

• Iguchi Tadashi

  Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

• Kashiwagi Shinsuke

  HORIBA, Ltd., 2 Miyanohigashi, Kisshoin, Minami-ku, Kyoto 601-8510, Japan

• Kakinuma Shigeru

  HORIBA, Ltd., 2 Miyanohigashi, Kisshoin, Minami-ku, Kyoto 601-8510, Japan

• Kodera Masako

  Process and Manufacturing Engineering Center, Toshiba Semiconductor Company, 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

• Tamura Mizuki

  Toshiba I. S. Corp., 8 Shinsugita-cho, Isogo-ku, Yokohama 235-8522, Japan

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著作論文

• Nanoscale Stress Field Evaluation with Shallow Trench Isolation Structure Assessed by Cathodoluminescence Spectroscopy, Raman Spectroscopy, and Finite Element Method Analyses

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